1. High-wavelength-resolution extreme-ultraviolet multilayer mirror
- Author
-
Nagata, Shin'ichi, Tsuneta, Saku, Sakao, Taro, Yoshida, Tsuyoshi, Hara, Hirohisa, Kano, Ryouhei, Ishiyama, Wakana, Murakami, Katsuhiko, and Ohtan, Masayuki
- Subjects
Mirrors -- Research ,Silicon carbide -- Usage ,Ultraviolet astronomy -- Equipment and supplies ,Astronomy ,Physics - Abstract
Multilayer mirrors with a system wavelength resolution ([Lambda]/[Delta][Lambda]) as high as 30-50 are required for the diagnostics of cosmic plasmas with temperatures of 1-20 MK. Such a high wavelength resolution can be realized by increasing the number of layer pairs contributing to the reflectance, by selecting less-absorbing materials for both the reflector and the spacer, and by decreasing the thickness of the reflector. We have fabricated a multilayer mirror tuned to 284 [Angstrom] with a silicon carbide reflector (20% thickness of the layer period) and an aluminum spacer and achieved [Lambda]/[Delta][Lambda] [similar to] 26.8 with a peak reflectivity of [approximately]13.0%. This wavelength resolution is close to the value obtained with a numerical simulation and is considerably higher than the value obtained with the conventional Mo/Si multilayer. Key words: Extreme-ultraviolet optics, multilayer, silicon-carbide, plasma diagnostics, astrophysical plasma.
- Published
- 1997