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This study has demonstrated, for the first time, the potential application of coatings to protect bricks or architectures against detrimental atmospheric effects via a self-cleaning approach. In this research, a facile fabrication method was developed to produce amorphous SiO2 particles and their hierarchical structures via applying trimethylchlorosilane (TMCS). They were fully characterized by various surface analytic tools, including a goniometer, SEM, AFM, zeta sizer, and a spectroscopic technique (FTIR), and then applied as super hydrophobic coatings on glass and sand. The characterization results revealed that the SiO2 particles are amorphous, quasi-spherical particles with an average diameter of 250–300 nm, and the hierarchical structures in the film were assembled from building blocks of SiO2 and TMCS. The wettability of the films can be controlled by changing the pH of the SiO2/TCMS dispersion. A super hydrophobic surface with a water contact angle of 165° ± 1° was achieved at the isoelectric point of the films. The obtained translucent super hydrophobic SiO2/TMCS coatings show good self-cleaning performances for glass and sand as construction materials. This study indicated that the superhydrophobic coatings may have potential applications in the protection of buildings and construction architectures in the future. [ABSTRACT FROM AUTHOR]

In this report, 38 nm-thick amorphous zinc-tin oxide (a-ZTO) films were deposited by radio frequency magnetron cosputtering. a-ZTO films were annealed by in situ monitoring of the sheet resistance improvements during the annealing process. A sharp drop in the slope of the sheet resistance curve was observed. The activation energies for the sheet resistance slope were calculated. The activation energy of the reaction for a sharp drop in the slope is much higher than the activation energy for the rest of the slope. Based on the activation energy values, six annealing temperatures were selected to saturate the highest conductivity at lower annealing temperatures and to identify the effects associated with annealing time. We found a direct correlation between annealing temperatures and the duration of the annealing treatment. a-ZTO films with a high conductivity of 320 S/cm were achieved by annealing at a temperature of 220 °C. It is noteworthy that the annealing temperature of 220 °C has clearly replaced the temperature of 300 °C. An irreversible decrease in resistivity was observed for all films. The conduction mechanism of films before and after annealing was determined. We confirm that all films individually exhibit semiconducting and metallic behaviors in the conduction mechanism before and after the lowest resistivity saturation., Competing Interests: The authors declare no competing financial interest., (© 2024 The Authors. Published by American Chemical Society.)