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21 results on '"Tien-Chun, Yang"'

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1. Anatomical variations in 3D imaging: A case report of a dorsal metacarpal artery anomaly

2. Morphological and Molecular Defects in Human Three-Dimensional Retinal Organoid Model of X-Linked Juvenile Retinoschisis

3. An Update on Mesoporous Silica Nanoparticle Applications in Nanomedicine

4. CEBPB/POU2F2 modulates endothelin 1 expression in prehypertensive SHR vascular smooth muscle cells

5. Mitochondrial transport mediates survival of retinal ganglion cells in affected LHON patients

6. Carboxylated nanodiamond-mediated CRISPR-Cas9 delivery of human retinoschisis mutation into human iPSCs and mouse retina

7. An Update on Mesoporous Silica Nanoparticle Applications in Nanomedicine

8. Morphological and Molecular Defects in Human Three-Dimensional Retinal Organoid Model of X-Linked Juvenile Retinoschisis

9. Contributors

10. Induced pluripotent stem cell–based leber hereditary optic neuropathy model

11. P3HT:Bebq2-Based Photovoltaic Device Enhances Differentiation of hiPSC-Derived Retinal Ganglion Cells

12. P3HT:Bebq

13. Bioactivity and gene expression profiles of hiPSC-generated retinal ganglion cells in MT-ND4 mutated Leber's hereditary optic neuropathy

14. Cell death caused by the synergistic effects of zinc and dopamine is mediated by a stress sensor gene Gadd45b - implication in the pathogenesis of Parkinson's disease

15. Elongation of Axon Extension for Human iPSC-Derived Retinal Ganglion Cells by a Nano-Imprinted Scaffold

16. Effect of physical stress on the degradation of thin SiO/sub 2/ films under electrical stress

17. Dependence of Fermi level positions at gate and substrate on the reliability of ultrathin MOS gate oxides

18. Elongation of Axon Extension for Human iPSC-Derived Retinal Ganglion Cells by a Nano-Imprinted Scaffold.

19. Growth And Characterization of Thin Wet Oxides Grown by Rapid Thermal Processing

20. Dependence of Reliability of Ultrathin Mos Gate Oxides on the Fermi Level Positions at Gate and Substrate

21. Effect of Growth Conditions on the Reliability of Ultrathin MOS Gate Oxides

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