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This Proceedings is a collection of papers presented at the Third Annual Conference on Superconductivity and Applications organized by the New York State Institute on Superconductivity. This year the Conference was held at the Buffalo Hilton Hotel on September 19- 21, 1989, with previous meetings on September 28-29,1987, and April 18-20, 1988. As in previous years, this meeting was highly successful, with an attendance of over three hundred researchers participating in lively scientific exchanges and discussions. The high quality of the talks is evident in this Proceedings. The field of high temperature superconductivity has matured considerably since its early days of media frenzy and rapid new discoveries. However, the enthusiasm and pace of research have not slowed down. A much better picture of the nature of high temperature superconductivity, the properties of these new materials and where they may find their eventual use has emerged. Processing techniques, especially thin film deposition, have been perfected nearly to the point of allowing commercial applications. We expect continued phenomenal growth of the field of high temperature superconductivity, both in terms of research and applications for many years to come.

The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.

The Conference on the Science and Technology of Thin Film Superconductors was conceived in the early part of 1988 as a forum for the specialist in thin film superconductivity. The conference was held on November 14-18, 1988, in Co lorado Springs, Co lorado. Al though many excellent superconductivity conferences had been convened in the wake of the 1986-1987 discoveries in high temperature superconductivity, thin film topics were often dispersed among the sessions of a more general conference agenda. The response to the Conference on the Science and Technology of Thin Film Superconductors confirmed the need for an extended conference devoted to thin film superconductors. These proceedings are a major contribution to the technnology of thin film superconductivity because of the breadth and quality of the articles provided by leaders in the field. The proceedings are divided into articles on laser deposition, sputtering, evaporation, metal organic chemical vapor deposition, thick film, substrate studies, characterization, patterning and applications, and general properties. Most of the articles discuss scientific issues for high temperature thin film superconductors, although the conference was to be a forum for technology and scientific questions for both low and high temperature superconductivity. For the first day of the 5 day conference, Lawrence Berkeley Laboratory had organized an excellent set of short courses in superconduc t ing thin film devices.

This conference is the second on the Science and Technology of Thin Film Superconductors. It proved to be an excellent forum for these specialists in thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es and advances made in this technology since the first conference in November 1988, reflect on the maturity of the topic. These proceedings contain artic1es on deposition methods by sputtering, e1ectron beam evaporation, resistive evaporation, laser ablation, chemical vapor deposition and electrodeposition, and on other studies related to substrates, thermodynamics of formation, grain boundaries and weak links, characterization, and some practical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of high-temperature superconductor thin films. Other highlights at the conference dealt with (1) critical parameters or problems in measuring critical current density and other important parameters, and (2) problems of scale-up, reproducibility, and amenability to device fabrication. It became evident from the presentations that three issues were developing into critical issues for the ultimate practical application of high­ temperature superconductor thin films.

Advances in synthesis and characterization of dielectric, piezoelectric and ferroelectric thin films are included in this volume. Dielectric, piezoelectric and ferroelectric thin films have a tremendous impact on a variety of commercial and military systems including tunable microwave devices, memories, MEMS devices, actuators and sensors. Recent work on piezoelectric characterization, AFE to FE dielectric phase transformation dielectrics, solution and vapor deposited thin films, and materials integration are among the topics included. Novel approaches to nanostructuring, characterization of material properties and physical responses at the nanoscale also is included.

Ceramic Thin Films and Coatings for Protective, Tribological and Multifunctional ApplicationsSelected papers from the 12 th International Ceramics Congress, part of CIMTEC 2010-12 th International Ceramics Congress and 5th Forum on New Materials, Montecatini Terme, Italy, June 6-11, 2010

Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications.Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies.This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy.

This volume constitutes the proceedings of the tenth meeting of the International school on Condensed Matter Physics. Since 1980, this community of condensed matter scientists has gathered in Varna, Bulgaria, every two years, to review and discuss the development of various investigations in the field, to present the latest results, and to outline the most important trends in condensed matter science.The book reflects the development of the field, and points to the growing interest in the application of theoretical achievements and to the mutual inspirations of science and technology.

There is a major international interest in thin film materials and devices, Future Directions in Thin Film Science and Technology stimulated by important current and projected applications in many areas of information technology and other fields, constitutes the proceedings of the Ninth International School on Condensed Matter Physics. It features invited review articles by over 40 scientists of international repute, covering many aspects of thin film science and technology. Also included is a broad selection of shorter contributed papers by other participants, describing results of their recent research.The book will be of interest to postgraduate students and established scientists involved in the fabrication, characterisation, and applications of thin film materials and devices. The invited reviews will also be of value to final year undergraduates in physics, materials science, and electronic engineering studying many areas of contemporary solid state technology.