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A new Optics Beamline coupled to a versatile UHV reflectometer is successfully operating at BESSY-II. It is used to carry out at-wavelength characterization and calibration of in-house produced gratings and novel nano-optical devices as well as mirrors and multilayer systems in the UV and XUV spectral region. This paper presents most recent commissioning data of the beamline and shows their correlation with initial beamline design calculations. Special attention is paid to beamline key parameters which determine the quality of the measurements such as high-order suppression and stray light behavior. The facility is open to user operation.

At BESSY-II a new UV-and XUV optics beamline [1] has recently been setup with an in-house developed versatile reflectometer [2], [3], [4] for at-wavelength metrology on reflective and diffractive optical elements up to 4 kg mass. High precision measurements of the reflection and polarization properties are feasible by a 360° azimuthal rotation of the sample around the beam of light, where samples can be adjusted reproducibly with a novel UHV-Tripod within arc sec and μm precision. The azimuthal rotation requires an extremely high precision adjustment of the goniometer axis with respect to the incident light beam. Here we describe sophisticated methods with which we achieve nearly perfect agreement of the azimuthal rotation axis and the synchrotron beam in the 30 arc sec range. By using geodetic instruments (lasertracker, theodolite, autocollimator) the quality of the reflectometer UHV-mechanics has been characterized with respect to stiffness and radial run out with highest precision [5].

A new optics beamline and a versatile 11-axes UHV-reflectometer for at-wavelength characterization of real life-sized UV- and XUV-reflection gratings and other (nano-) optical elements has been set up and is in operation at BESSY-II. Azimuthal rotation of samples allows for reflectometry and polarimetry measurements in s- and p-polarization., A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY-II. The Plane Grating Monochromator beamline operated in collimated light (c-PGM) is equipped with an SX700 monochromator, of which the blazed gratings (600 and 1200 lines mm−1) have been recently exchanged for new ones of improved performance produced in-house. Over the operating range from 10 to 2000 eV this beamline has very high spectral purity achieved by (i) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (ii) by absorber filters for high-order suppression. Stray light and scattered radiation is removed efficiently by double sets of in situ exchangeable apertures and slits. By use of in- and off-plane bending-magnet radiation the beamline can be adjusted to either linear or elliptical polarization. One of the main features of a novel 11-axes reflectometer is the possibility to incorporate real life-sized gratings. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system carrying a load up to 4 kg, and the reflectivity can be measured between 0 and 90° incidence angle for both s- and p-polarization geometry. This novel powerful metrology facility has gone into operation recently and is now open for external users. First results on optical performance and measurements on multilayer gratings will be presented here.

We present the first experimental data obtained from the new microfocus beamline U41-PGM recently put into operation. The optical layout of the beamline has been designed to conserve the high spectral brillance of the undulator source. The beamline consists of a collimated plane grating monochromator (PGM) and a subsequent refocusing stage. A toroidal mirror is used for refocusing onto the sample surface. With the 600 1/mm grating an absolute photon flux between 10 12 and 10 13 photons per second has been recorded over the whole energy range. Although the monochromator is not designed to deliver highest energy resolution, a resolving power of up to 6000 at the nitrogen K-edge has been obtained recently. The fixfocus constant c ff is variable in a wide range. According to the experimental requirements it can be set to select either high photon flux or energy resolution.

At BESSY a new six-strut arrangement for general small travel mirror adjustment mechanisms has been developed. This patented (Patent DE 10042802.5) arrangement allows very simple movements in all six linear and rotational degrees of freedom. The movements of the mirror are simply determined by moving either one drive, or up to three drives by the same amount. The first mirror adjustment systems of this design is successfully in operation since the start of BESSY II. Their performance and reliability is very satisfactory. This contribution will present the concepts.