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1. Photolytic dual-media nuclear pumping of excimer lasers

2. Deep uv lithography by using excimer lasers. (Photo-etching characteristics and development of an uniform intensity irradiation system)

3. SRS of XeF laser radiation in hydrogen using collimated beams

5. Anti-stokes raman scattering of excimer and tunable UV lasers in chemically pumped CO

6. Two and three photon ionization of xenon

7. Excimer lasers with high spectral brightness working in the regenerative amplifier regime

8. Triatomic rare gas halide excimers

9. Aperture combined raman laser

10. Sprite-a high power E-beam pumped KrF laser

11. Transient Index of XeF

12. Tuning and saturation behavior of the anti-skokes raman laser

13. Efficiency optimization for discharge-excited high-energy excimer laser

14. Inductively stabilized long-pulsed excimer lasers

15. Spectroscopic and dynamics studies in the extreme ultraviolet: recent progress and future possibilities

16. Direct measurement of saturation property of an electron beam pumped KrF laser

17. Generation of electronically excited products in the multiphoton dissociation of phosgene at 193 nm

18. Cryogenic gas purification and lifetime extension of ArF, KrF and XeF laser gas mixtures

19. Temperature dependence of the raman linewidth in H2∗

20. Phase conjugation at 193 nm

21. Experimental study of chlorine donors for the triatomic exciplex Xe2Cl

22. Angular distribution and bandwidth effects observed in stimulated raman emission

23. Semiconductor processing with excimer lasers

24. Laser-induced fluorescence studies of XeF(B−X) and XeF(C−X)

25. High-energy ultraviolet I2 laser

26. Pulse length limitations in self-sustained discharge XeCl∗ lasers

27. Mercury halide spectroscopy

28. Discharge characteristics and output performance of a UV-preionized XeCl laser

29. Wavelength conversion with excimer lasers

30. Excimer-laser interface chemistry for microelectronic processing

31. Quenching and formation processes of XeF and Xe2F excimers

32. Collision free generation of highly ionized atomic species with 193 nm radiation

33. Third-harmonic conversion of XeF laser radiation

35. Use of XeCl amplifiers for degenerate four-wave mixing

36. XUV excitation of H2 using the third harmonic of a frequency-doubled dye laser

37. High-power VUV stimulated emission from two-photon excited H2

38. Photodissociation of Xe+2 and Kr+2 in the ultraviolet: Application to Xe2Cl formation kinetics

39. Time resolved amorphous silicon formation from laser melted liquid silicon films

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