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Your search keyword '"Terashima, Katsutomo"' showing total 13 results
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13 results on '"Terashima, Katsutomo"'

2. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Author

Saito, Takashi, primary, Suzuki, Toru, additional, Yoshino, Masaya, additional, Wakabayashi, Osamu, additional, Matsunaga, Takashi, additional, Fujimoto, Junichi, additional, Kakizaki, Kouji, additional, Yamazaki, Taku, additional, Inoue, Toyoharu, additional, Terashima, Katsutomo, additional, Enami, Tatsuo, additional, Inoue, Hirotoshi, additional, Sumitani, Akira, additional, Tomaru, Hitoshi, additional, and Mizoguchi, Hakaru, additional

Published
2003
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3. Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Author

Saito, Takashi, primary, Matsunaga, Takashi, additional, Mitsuhashi, Ken-ichi, additional, Terashima, Katsutomo, additional, Ohta, Takeshi, additional, Tada, Akifumi, additional, Ishihara, Takanobu, additional, Yoshino, Masaya, additional, Tsushima, Hiroaki, additional, Enami, Tatsuo, additional, Tomaru, Hitoshi, additional, and Igarashi, Tatsushi, additional

Published
2001
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7. High-repetition-rate ArF excimer laser for microlithography.

Author

Wakabayashi, Osamu, Enami, Tatsuo, Ishii, Ken, Terashima, Katsutomo, Itakura, Yasuo, Watanabe, Takayuki, Ohta, Takeshi, Ohbu, Ayako, Kubo, Hirokazu, Tanaka, Hirokazu, Andou, Satoshi, Matsunga, Takashi, Umeda, Hiroshi, Suzuki, Toru, Sumitani, Akira, and Mizoguchi, Hakaru

Published
2000
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8. High-repetition-rate ArF excimer laser for microlithography

Author

Wakabayashi, Osamu, primary, Enami, Tatsuo, additional, Ishii, Ken, additional, Terashima, Katsutomo, additional, Itakura, Yasuo, additional, Watanabe, Takayuki, additional, Ohta, Takeshi, additional, Ohbu, Ayako, additional, Kubo, Hirokazu, additional, Tanaka, Hirokazu, additional, Andou, Satoshi, additional, Matsunga, Takashi, additional, Umeda, Hiroshi, additional, Suzuki, Toru, additional, Sumitani, Akira, additional, and Mizoguchi, Hakaru, additional

Published
2000
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9. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Author

Enami, Tatsuo, primary, Wakabayashi, Osamu, additional, Ishii, Ken, additional, Terashima, Katsutomo, additional, Itakura, Yasuo, additional, Watanabe, Takayuki, additional, Ohta, Takeshi, additional, Ohbu, Ayako, additional, Kubo, Hirokazu, additional, Tanaka, Hirokazu, additional, Suzuki, Toru, additional, Sumitani, Akira, additional, and Mizoguchi, Hakaru, additional

Published
2000
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12. 1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage

Author

Enami, Tatsuo, primary, Ohta, Takeshi, additional, Tanaka, Hirokazu, additional, Kubo, Hirokazu, additional, Suzuki, Toru, additional, Sunaka, Fumika, additional, Terashima, Katsutomo, additional, Sumitani, Akira, additional, Kawasa, Youichi, additional, Wakabayashi, Osamu, additional, and Mizoguchi, Hakaru, additional

Published
1999
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