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2. Impact of deposition temperature on electrical properties of HZO-based FeRAM.

11. Phase transformation on HZO ferroelectric layer in ferroelectric random-access memory induced by x-ray irradiation.

16. Forming-Free HfO2-Based Resistive Random Access Memory by X-Ray Irradiation

19. Use of a supercritical fluid treatment to improve switching region in resistive random access memory

22. Effects of X-ray accelerating voltage on electrical properties and reliability for ferroelectric random-access memory (FeRAM)

24. Performance Improvement by Modifying Deposition Temperature in HfZrO x Ferroelectric Memory

25. Abnormal hump in low temperature in SiGe devices with silicon capping insertion layer

29. Obtaining impact ionization-induced hole current by electrical measurements in gallium nitride metal–insulator–semiconductor high electron mobility transistors

30. Realizing forming-free characteristic by doping Ag into HfO2-based RRAM

31. Improving Performance by Inserting an Indium Oxide Layer as an Oxygen Ion Storage Layer in HfO₂-Based Resistive Random Access Memory

32. Forming-Free HfO2-Based Resistive Random Access Memory by X-Ray Irradiation

33. Analyzing the interface trap density in SiGe capacitors using an abnormal flat band voltage shift at low temperature

34. Investigation on the current conduction mechanism of HfZrOx ferroelectric memory

35. Impact of electrode thermal conductivity on high resistance state level in HfO2-based RRAM

36. Incorporation of Resistive Random Access Memory into Low‐Temperature Polysilicon Transistor with Fin‐Like Structure as 1T1R Device

37. Improvement of Resistive Switching Characteristics in Zinc Oxide-Based Resistive Random Access Memory by Ammoniation Annealing

38. Abnormal High Resistive State Current Mechanism Transformation in Ti/HfO2/TiN Resistive Random Access Memory

39. Stabilizing resistive random access memory by constructing an oxygen reservoir with analyzed state distribution

41. Investigation of the forming process under UV illumination in HfO2-based resistance random access memory with a transparent electrode

42. The influence of temperature on set voltage for different high resistance state in 1T1R devices

43. Realizing forming-free characteristic by doping Ag into HfO2-based RRAM.

44. Investigation on the current conduction mechanism of HfZrOx ferroelectric memory.

45. Impact of electrode thermal conductivity on high resistance state level in HfO2-based RRAM.

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