20 results on '"Takei, Munehisa"'
Search Results
2. Channel Strain Analysis in Damascene-gate pMOSFETs on Si (100) and (110) Substrate by Conventional and Cross-sectional Raman Spectroscopy
3. Channel strain analysis in high-performance damascene-gate p-metal-oxide-semiconductor field effect transistors using high-spatial resolution Raman spectroscopy.
4. Evaluation of phonon confinement in ultrathin-film silicon-on-insulator by Raman spectroscopy
5. Nanocrystalline-Si-dot multi-layers fabrication by chemical vapor deposition with H-plasma surface treatment and evaluation of structure and quantum confinement effects
6. Super-Resolution Raman Spectroscopy by Digital Image Processing
7. Stress evaluation in thin strained-Si film by polarized Raman spectroscopy using localized surface plasmon resonance
8. Channel Strain Measurement in 32-nm-Node Complementary Metal–Oxide–Semiconductor Field-Effect Transistor by Raman Spectroscopy
9. Improvement of Spatial Resolution in Raman Spectroscopy Selecting Measurement Area by Opaque Material Deposition
10. Evaluation of Strained Silicon by Electron Back Scattering Pattern Compared with Raman Measurement and Edge Force Model Calculation
11. Evaluation of Strained-Silicon by Electron Backscattering Pattern Measurement: Comparison Study with UV-Raman Measurement and Edge Force Model Calculation
12. Mobility and Velocity Enhancement Effects of High Uniaxial Stress on Si (100) and (110) Substrates for Short-Channel pFETs
13. Cross-Sectional UV-Raman Measurement for Obtaining Two-Dimensional Channel Stress Profile in Extremely High-Performance pMOSFETs
14. Suppression Mechanism of Volume Shrinkage for SOG Film by Plasma Treatment
15. Study of Charge Trap Sites in SiN Films by Hard X-ray Photoelectron Spectroscopy
16. Evaluation of Anisotropic Biaxial Stress by Raman Spectroscopy with a High Numerical Aperture Immersion Objective Lens
17. Channel-Stress Enhancement Characteristics for Scaled pMOSFETs by Using Damascene Gate With Top-Cut Compressive Stress Liner and eSiGe
18. Study of Strain Induction for Metal–Oxide–Semiconductor Field-Effect Transistors using Transparent Dummy Gates and Stress Liners
19. Improvement of CVD SiO2 by Post Deposition Microwave Plasma Treatment
20. Evaluation and Control of Strain in Si Induced by Patterned SiN Stressor
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.