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The structural and electrochemical characteristics of the Ln2-xSrxNiO4+δ (Ln = La and Pr; x = 0–1.4) system were investigated to clarify the relationship between the electrocatalytic activity and various characteristics such as the structure, composition, electrical conductivity, and oxygen content. Rietveld analysis of the powder X-ray diffraction (XRD) data showed that the tetragonal distortion of the NiO6 octahedra decreased monotonically with an increase of x, while the Ln (Sr)–O (//c-axis) in the rock-salt block was expanded with an increase in x, although the tetragonality, c/a showed a maximum at x = 0.6. Cyclic voltammetry (CV) measurements showed that the activity for the oxygen evolution reaction (OER) increased with x, while that of the oxygen reduction reaction (ORR) was independent of x. The characteristic peak due to oxygen insertion into the lattice was observed at ca. 1.45 V vs. RHE, the intensity of which increased with the Sr content, which reflects the increase in the internal chemical diffusion of oxygen species. X-ray photoelectron spectroscopy (XPS) measurements for the constituent elements confirmed the presence of OH− groups inside the catalyst particles, especially in the Sr-rich region. It is suggested that the reversible intercalation ability of the OH− group into the rock-salt layer in the Ruddlesden-Popper (RP) phase (An+1BnO3n+1) contributes significantly to the improvement of the OER activity.

Recent studies report that surfaces displaying micrometer-or nanometer-sized undulating structures exhibit antibacterial effects. In previous work, we described the use of an advanced nanofabrication technique to generate an artificial biomimetic moth-eye film by coating a polyethylene terephthalate (PET) film with nanoscale moth-eye protrusions made from a hydrophilic resin. This moth-eye film exhibited enhanced antibacterial effects in in vitro experiments. The aim of the present study was to verify the antibacterial efficacy of the Moth-eye film in practical environments. Three types of films (Moth-eye film, Flat film, and PET film) were used to compare antibacterial effects. Sample films were pasted onto hand-wash sinks at the testing locations. After several hours of elapsed time, bacteria from the surface of sample films were collected using one of three kinds of culture media stampers (to permit identification of bacterial species). The stampers were incubated for 48 hours at 35 °C, and the numbers of colonies were counted.The number of common bacteria including E. coli and S. aureus from the Moth-eye film was significantly lower than that from the PET film (p

The antibacterial effect of a nanostructured film, known as “moth-eye film,” was investigated. The moth-eye film has artificially formed nano-pillars, consisting of hydrophilic resin with urethane acrylate and polyethylene glycol (PEG) derivatives, all over its surface that replicates a moth’s eye. Experiments were performed to compare the moth-eye film with a flat-surfaced film produced from the same materials. The JIS Z2801 film-covering method revealed that the two films produced a decrease in Staphylococcus aureus and Esherichia coli titers of over 5 and 3 logs, respectively. There was no marked difference in the antibacterial effects of the two surfaces. However, the antibacterial effects were reduced by immersion of the films in water. These results indicated that a soluble component(s) of the resin possessed the antibacterial activity, and this component was identified as PEG derivatives by time-of-flight secondary ion mass spectrometry (TOF-SIMS) and Fourier transform infrared spectroscopy (FT-IR). When a small volume of bacterial suspension was dropped on the films as an airborne droplet model, both films showed antibacterial effects, but that of the moth-eye film was more potent. It was considered that the moth-eye structure allowed the bacteria-loaded droplet to spread and allow greater contact between the bacteria and the film surface, resulting in strong adherence of the bacteria to the film and synergistically enhanced bactericidal activity with chemical components. The antibacterial effect of the moth-eye film has been thus confirmed under a bacterial droplet model, and it appears attractive due to its antibacterial ability, which is considered to result not only from its chemical make-up but also from physical adherence.

To develop a compact and low cost excess sludge reduction system, alkaline treatments were carried out using sludge from a petroleum refinery. Alkaline treatment with a concentration of 0.025-0.05 mol/L solubilized about 30% of the sludge after 1 h. Alkaline wastes from petroleum refinery such as sodium sulfide, sodium hydrosulfide, and diisopropanol amine could be used to solubilize about 10-30% of the sludge. Combination of alkaline solubilization (0.05 mol/L NaOH) and high speed mixing achieved about 50% solubilization rate after 1 h at 25°C. Application of this system in a petroleum refinery (600 m3 aeration vessel and 450 m3 sedimentation vessel, 3 m3 solubilization vessel) resulted in average solubilization rate of 44% and reduction rate of sludge of 47% during 64 days operation. Return of alkaline solubilized broth into the aeration vessel did not affect the treatment. In 40 L bench scale experiments, solubilization rate of 59% and sludge reduction rate of 94% were obtained when the amount of sludge solubilization was increased up to 2-3 times of excess sludge produced under the standard activated sludge treatment without the solubilization process.

Background Recent studies report that surfaces displaying micrometer- or nanometer-sized undulating structures exhibit antibacterial effects. In previous work, we described the use of an advanced nanofabrication technique to generate an artificial biomimetic Moth-eye film by coating a polyethylene terephthalate (PET) film with nanoscale moth-eye protrusions made from a hydrophilic resin. This moth-eye film exhibited enhanced antibacterial effects in in vitro experiments. The aim of the present study was to verify the antibacterial efficacy of the Moth-eye film in practical environments. Materials and methods The antibacterial effects of three types of film (Moth-eye film, Flat film, and PET film) were compared. Sample films were pasted onto hand washing basins at the testing locations. After several hours, bacteria were collected from the surface of the sample films with one of three kinds of culture media stamper (to permit identification of bacterial species). The stampers were incubated for 48 hours at 35°C, and the numbers of colonies were counted. Results and discussion The number of common bacteria including E. coli and S. aureus obtained from the Moth-eye film was significantly lower than those from the PET film (p

Reduction of waste materials has become very important in the petroleum industry. Sludge accounts for 51% of waste materials produced in petroleum plants. Most sludge is excess activated sludge discharged by wastewater treatment. We previously developed a new technology to solubilize excess sludge using a combination of alkaline solubilization and high speed mixing. The present study investigated the relationships between sludge solubilization and reduction of final amount of excess sludge based on model experiments with bench scale equipment. Amount of reduced excess sludge was increased with higher amount of solubilized sludge until the amount of solubilized sludge was lower than the excess sludge without solubilization. The amount of reduced excess sludge was approximately equal to the amount of solubilized sludge. COD and T-N concentrations in outlet water and removal rates were not changed with alkaline solubilization. Organic matter in the activated sludge was decreased with higher amount of solubilized sludge due to ash accumulation.

A practical solubilization plant (3 m3) for activated sludge was constructed beside the wastewater treatment plant (600 m3 activated sludge vessel) of a petroleum refinery to solubilize activated sludge with a combination of alkaline treatment and high speed mixer. In the preliminary experiments, optimum alkaline concentration and rotation speed were determined as 0.025 mol/l and 2500 rpm, which gave 40-50% solubilization. Extended operation under these optimum conditions achieved continuous solubilization and return of alkaline solubilized broth into the activated sludge vessel for 64 days. Excess sludge of 144 kg-dry weight/day produced normally in this wastewater plant without solubilization was solubilized and returned by this new plant. The COD of treatment water was 12-27 mg/l and COD removal was 87%. Final average reduction of excess sludge was up to 47% during the 64 days. This new solubilization and sludge reduction plant is stable during extended operation for the reduction of activated sludge without damage to activated sludge.

製油所由来活性汚泥を製油所由来廃棄物を利用して減容化するための基礎知見を得るため，種々の薬剤の汚泥可溶化に及ぼす影響を検討した。廃ソーダや硫化ソーダは水酸化ナトリウムと同等の可溶化力を示した。約10～30分で30～34％の可溶化が達成され，都市下水活性汚泥より急速な可溶化が認められた。アミン類も少ないながら可溶化促進効果を示した。また，温度を上昇させ60℃にすると，廃ソーダや硫化ソーダによる10～30分の処理で45～50％の可溶化が達成された。製油所由来活性汚泥の可溶化が早い理由として，都市下水活性汚泥に比べ微生物相が単純で，細菌相が多いためと推定された。

前報にて，製油所由来活性汚泥を製油所由来アルカリ廃棄物で減容化（可溶化）できることが認められたため，今回，高速撹拌による物理的処理を組み合わせて，可溶化処理の促進効果を検討した。 その結果，市販高速ミキサーを用いて12,000 rpm（線速度15 m/s）で，0.05 mol/l のアルカリ条件で可溶化すると，30分で40％，1時間で50％と，高速撹拌処理を行わない場合に比べ，効果が1.3～1.4倍に増大した。温度を50℃に上昇させると，可溶化促進効果は1時間で55％ にも達し，高速撹拌処理に温度を加えると，可溶化効果はより促進されることを認めた。 さらに，1 m3のベンチスケール可溶化装置を試作し，実験室で得られた最適条件下，実際の廃ソーダを用いた可溶化処理を行ったところ，ほぼ同等の可溶化効果が達成され，簡易な高速撹拌とアルカリ廃棄物の組合せの実用性が確認された。

女性の生理的に起こりうる全身的変化として閉経がある。この生理的なホルモン分泌の減少期が歯周疾患の進行に与える影響を調査する目的で, 閉経前と閉経後の女性歯周疾患罹患患者を被験者として, 臨床パラメーターと歯槽骨吸収量とを比較した。被験者総数は233名 (閉経前群125名, 閉経後群108名) であり, 全身疾患および歯周治療の既往がなく, 咬合性外傷, 若年性歯周炎と診断されたものは除外した。女性歯周病患者各群は閉経前群と閉経後群に, 閉経後群は閉経1～5年群, 閉経6～10年群および閉経11年以上群に分類した。さらに男性歯周病患者106名を対象群とした。被験者は10年ごとの年齢層, 閉経後年数, 歯周疾患進行度により分類した。臨床パラメーターとして現在歯数, プラークコントロールレコード, プロービングによるポケット深さ, Gingival Index, 動揺度, Gingival Bleeding Indexを測定し, さらに歯槽骨吸収量をデンタルX線写真を用いて測定した。歯槽骨吸収量および臨床パラメーターは女性患者の閉経前後群および男性患者群とを比較した。その結果, 閉経前群と比較して閉経後群が歯槽骨吸収量は大きく, 前歯部に閉経後歯槽骨吸収量が大きかった。閉経後群の女性を同年齢層の男性患者群と比較すると, 閉経後問もない50歳代で歯槽骨吸収量が有意に大きくなったことから, 女性の歯周疾患患者における歯槽骨吸収量の増加には閉経というホルモン分泌の激減する全身的変化の影響が考えられた。

Intraoperative acetabular fracture is a rare complication of primary total hip arthroplasty (THA), typically occurring during impaction of the cementless acetabular component. Here we report an unusual case of pelvic discontinuity caused by overreaming of the acetabulum during primary THA. Restoration of posterior columnar continuity was achieved with an autologous fibular graft and a reconstruction plate. Wall defects and cavitary defects were reconstructed with metal mesh and femoral head allograft, followed by placement and fixation of a Kerboull-type acetabular reinforcement device. Previous reports of acetabular fracture during THA have indicated that it has a relatively good prognosis without extensive treatment. However, to our knowledge, there has been no report of pelvic discontinuity necessitating acetabular reconstruction surgery as an intraoperative complication of primary THA.

The lithography challenges posed by the 20 nm and 14 nm nodes continue to place strict minimum feature size requirements on photomasks. The wide spread adoption of very aggressive Optical Proximity Correction (OPC) and computational lithography techniques that are needed to maximize the lithographic process window at 20 nm and 14 nm groundrules has increased the need for sub-resolution assist features (SRAFs) down to 50 nm on the mask. In addition, the recent industry trend of migrating to use of negative tone develop and other tone inversion techniques on wafer in order to use bright field masks with better lithography process window is requiring mask makers to reduce the minimum feature size of opaque features on the reticle such as opaque SRAFs. Due to e-beam write time and pattern fidelity requirements, the increased use of bright field masks means that mask makers must focus on improving the resolution of their negative tone chemically amplified resist (NCAR) process. In this paper we will describe the development and characterization of a high resolution bright field mask process that is suitable for meeting 20 nm and early 14 nm optical lithography requirements. Work to develop and optimize use of an improved chrome hard mask material on the thin OMOG binary mask blank1 in order to resolve smaller feature sizes on the mask will be described. The improved dry etching characteristics of the new chrome hard mask material enabled the use of a very thin (down to 65 nm) NCAR resist. A comparison of the minimum feature size, linearity, and through pitch performance of different NCAR resist thicknesses will also be described. It was found that the combination of the improved mask blank and thinner NCAR could allow achievement of 50 nm opaque SRAFs on the final mask.. In addition, comparisons of the minimum feature size performance of different NCAR resist materials will be shown. A description of the optimized cleaning processes and cleaning durability of the 50 nm opaque SRAFs will be provided. Furthermore, the defect inspection results of the new high resolution mask process and substrate will be shared.

The lithography challenges posed by the 22 nm node continue to place stringent requirements on photomasks. The dimensions of the mask features continue to shrink more deeply into the sub-wavelength scale. In this regime residual mask electromagnetic field (EMF) effects due to mask topography can degrade the imaging performance of critical mask patterns by degrading the common lithography process window and by magnifying the impact of mask errors or MEEF. Based on this, an effort to reduce the mask topography effect by decreasing the thickness of the mask absorber was conducted. In this paper, we will describe the results of our effort to develop and characterize a binary mask substrate with an absorber that is approximately 20-25% thinner than the absorber on the current Opaque MoSi on Glass (OMOG) binary mask substrate. For expediency, the thin absorber development effort focused on using existing absorber materials and deposition methods. It was found that significant changes in film composition and structure were needed to obtain a substantially thinner blank while maintaining an optical density of 3.0 at 193 nm. Consequently, numerous studies to assess the mask making performance of the thinner absorber material were required and will be described. During these studies several significant mask making advantages of the thin absorber were discovered. The lower film stress and thickness of the new absorber resulted in improved mask flatness and up to a 60% reduction in process-induced mask pattern placement change. Improved cleaning durability was another benefit. Furthermore, the improved EMF performance of the thinner absorber [1] was found to have the potential to relieve mask manufacturing constraints on minimum opaque assist feature size and opaque corner to corner gap. Based on the results of evaluations performed to date, the thinner absorber has been found to be suitable for use for fabricating masks for the 22 nm node and beyond.

Photomask flatness and image placement specifications for advanced technology masks are becoming more stringent. Therefore, it is important to understand the various factors that affect final photomask flatness due to the direct impact it has on image placement. Past studies have demonstrated that final photomask flatness can be controlled by modifying the mounting process of photomask pellicle as well as changing the pellicle material itself [1][2][3][4]. In particular, our previous results demonstrate the ability to successfully eliminate data deviations by remounting the same pellicle for each experiment. This paper focuses on the relationship between mounting pressure and time on final photomask flatness. Our initial results indicate that mounting time has minimal influence on final photomask flatness; however, final photomask flatness is greatly impacted by varying mounting pressure. Finally we explore the relationship between the final photomask flatness and the image placement for post pellicle mounting onto the photomask.

With the advancement of technology, the need to produce flatter photomasks is critical to meet strict mask manufacturing requirements. Components such as pellicle mounting techniques, pellicle frame height, frame material and adhesive all play an important role in finished photomask flatness.1-5 In particular, recent studies have shown that adhesive flexibility affect final photomask flatness significantly.6 This has motivated pellicle suppliers to optimize adhesive properties in addition to evaluate new adhesives. The paper describes the joint evaluations between IBM, Toppan and MLI, performed to determine the effect of a new MLI adhesive on the distortion of photomasks. Due to the nature of this adhesive, minimal mounting force is required. As a result of utilizing extreme low mounting pressure, benefits such as decreased flatness distortion and ease of adhesive removal are observed. The goal of this paper is to evaluate this new adhesive offering and understand the various impacts it has on pelliclized photomasks for advanced technologies.

Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an important role in finished photomask flatness. Additional studies have shown that pellicle mounting techniques, pellicle adhesives, frame flatness and shape and pellicle mounting tools play a role as well. It has become clear that frame flexibility, coupled with frame mounting surface flatness and shape are the principal factors influencing the pellicle effect on the mask distortion. Pellicle suppliers have begun to evaluate various polymers as potential replacements for the standard aluminum frame in current use. The elasticity of the frame adhesive has also been adjusted to evaluate its effect on the pellicle influence on mask flatness. This paper describes some joint evaluations between IBM, Toppan and ShinEtsu, performed to determine the effect of pellicle frame composition,, mount surface flatness, adhesive elasticity and adhesive surface flatness on the distortion of photolithography masks. It demonstrates that polymer pellicle frames with more flexible adhesive improve finished mask flatness approximately the same amount as reducing the total frame standoff height of aluminum frames with conventional adhesive.

As technology advances, the demand for tighter photomask final flatness specifications becomes greater. Studies have shown that the process of mounting a pellicle induces the largest change in flatness in photomask fabrication. Photomask pellicles play an important role in flatness due to the many components in the mounting process. For example, pellicle frame flatness, pellicle adhesive, mounting force, mounting time, mounting orientation and mask backing shape during mount all can play a role in changing the mask shape during pellicle mount. Many of these factors have been investigated over the last several years [1][2][3][4]. Recent studies have demonstrated that the height of the pellicle frame also has a significant impact on the final flatness with lower stand off frames resulting in reduced pellicle influence on mask distortion [5]. This paper will examine the flatness influence factor as a function of mounting direction and mask backing variations. For these experiments, the same pellicle frame was remounted for each set of experiments to eliminate external pellicle frame flatness factors and to minimize the amount of data deviations. Four different types of mask backing types were selected that differed in the contact area with the mask in particular pressure points. The mask backing types consist of a border frame, 4 point pressure points, a full backing plate (quartz substrate), and a pellicle frame. In addition to using the four different types of mask backings, the pellicles were also mounted both in the vertical and horizontal directions in determining final photomask flatness. This work demonstrates that frame flatness and shape play the largest roles and mounting force, backing plate and mounting orientation have less of an effect.

As the required accuracy of the mask arises, Cr shading film thickness has been thinner gradually. CD linearity with the thinner Cr film thickness has better performance. However, it is difficult to apply thinner Cr film thickness simply under the condition of OD > 3, which is needed for wafer printing. So, we tried to develop new shading film. We adopted MoSi film, because MoSi film has almost no micro loading effect compared with Cr film. MoSi shading film with att.PSM satisfied OD > 3 at 193nm wavelength with good resist profile. But the issue was dry-etching selectivity, because shading layer material was the same of att. PSM layer material. Therefore super thin Cr etching stopper was inserted between MoSi shading layer and MoSi att.PSM layer. The mask CD performance of new blank was evaluated for CD linearity, CD through pitch, and global loading effect. This blank and mask process reduce loading effect, therefore the mask CD performance is improved remarkably. In conclusion, the mask manufacturing process margin was able to be expanded by this new blank and method, and it is expected that we can achieve the required specifications for att.PSM in 45nm node and beyond.

The attenuated phase-shift mask (att. PSM) is one of resolution enhancement technologies (RET) and has been widely adopted for several device layers. And the high-transmission att. PSM, which has various structures and transmittances, can be expected to have the advantages in process window. In this paper, the lithographic performances (Contrast, MEEF and DOF) of high-T att. PSM were evaluated by using the 3D electro-magnetic field simulator. The results showed that high-T att. PSM has better MEEF and partially better DOF than those of 6%-transmission MoSi type. As the transmittance is getting higher, the smaller line CD is needed for OPC adjustment especially at narrow pitch. In respect of film structure, it is found that there is no large difference among three high-T att. PSMs except for MEEF at specific pitch. Remaining chrome on the high-T films causes the trade-off between contrast and MEEF. The simulation results are compared with AIMS results measured by AIMS TM 45-193i of Carl Zeiss. The AIMS results of actual masks agree with no-Hopkins mode simulation very well, while they do not agree with Hopkins mode simulation especially at narrow pitch. Because the azimuthal polarization does not cause contrast loss, the differences between AIMS mode (conventional) and Scanner mode (vector effect emulation) are small.

A 54-year-old woman was admitted to our hospital with the complaint of right upper quadrant pain. Upon physical examination the vital signs of the patient were within normal ranges. Ultrasonography and computed tomography (CT) examination of the abdomen was obtained, which demonstrated a large dilatated cystic structure, measuring approximately 68.6 mm multiply 48.6 mm, with marked distension and inflammation. Additionally, the enhanced CT was characterized by the non-enhanced wall of the gallbladder. As the third examination in this study, magnetic resonance imaging (MRI), namely coronal MRI and magnetic resonance cholangio-pancreatogra (MRCP), were performed. The MRCP demonstrated a dilatation of the gallbladder but detected no neck of the gallbladder. Simple cholecystectomy was performed. Macroscopic findings included a distended and gangrenous gallbladder, and closer examination revealed a counterclockwise torsion of 360 degrees on the gallbladder mesentery. Coronal MRI and MRCP showing characteristic radiography may be useful in making a definitive diagnosis.

The immersion lithography for 45 nm generation has been developing aggressively for smaller critical dimension of semiconductor devices. The polarization lithography system is indispensable to have an advantage to use the immersion lithography with hyper NA (>1.0). As pattern size becomes smaller, mask induced polarization effects to polarization of exposure image seems not to be negligible. There are several issues about mask induced polarization. But dominant factor for mask induced polarization effect is not understood well. In this paper, in case of monolayer mask of att.PSM, degree of polarization (DoP) strongly depends on film thickness and extinction coefficient from simulation and experimental results. DoP depends on material factor. And in case of double layer mask, DoP depends on total film thickness and extinction coefficient of both upper layer and bottom layer. So, DoP depends also on structure of mask.

To demonstrate the clinical characteristics of patients with cervical cord injury (CCI) without bony injury in Japan.Retrospective review of 127 patients with CCI without bony injury treated between January 2003 and October 2005 at 11 institutions.Prevalence of CCI without bony injury was 32.2% among all CCIs and 0.81% among all blunt traumas. Mean age was 60.4 years (range, 19-90 years), with 104 patients (82%)or = 46 years old (older group). The major mechanism of injury among younger patients (46 years) was traffic injuries (39%), whereas minor falls (44%) predominated in older patients. High-energy mechanisms of injury were significantly more common for younger patients (35% versus 15%, p = 0.041). Mean injury severity score, abbreviated injury score for the head and Glasgow coma scale on admission were 17.2 +/- 4.7, 0.6 +/- 0.9, and 14.2 +/- 2.1, respectively. Incomplete CCI occurred in 88.7%. On plain cervical spine radiography, spinal canal stenosis and spondylosis or ossification of the posterior longitudinal ligament were more frequent in older patients than in younger patients (43% vs. 13%, p = 0.008; 54% vs. 17%, p = 0.002, respectively). No abnormal findings were seen in 52% of younger patients.CCI without bony injury occurred more frequently in this study population than previously reported. Degenerative changes and spinal canal stenosis represent important risk factors for developing CCI without bony injury and the present results suggest that this injury may occur in younger adults during high-energy injuries in the absence of pre-existing cervical spine disease.