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The rise of non-magnetic topological semimetals, which provide a promising platform for observing and controlling various spin-orbit effects, has led to significant advancements in the field of topological spintronics. RhSi exists in two distinct polymorphs: cubic and orthorhombic crystal structures. The noncentrosymmetric B20 cubic structure has been extensively studied for hosting unconventional multifold fermions. In contrast, the orthorhombic structure, which crystallizes in the Pnma space group (No. 62), remains less explored and belongs to the family of topological Dirac semimetals. In this work, we investigate the structural, magnetic, and electrical properties of RhSi textured-epitaxial films grown on Si(111) substrates, which crystallize in the orthorhombic structure. We investigate the efficiency of pure spin current transport across RhSi/permalloy interfaces and the subsequent spin-to-charge current conversion via inverse spin Hall effect measurements. The xperimentally determined spin Hall conductivity in orthorhombic RhSi reaches a maximum value of 126 ($\hbar$/e)($\Omega$.cm)$^{-1}$ at 10 K, which aligns reasonably well with first-principles calculations that attribute the spin Hall effect in RhSi to the spin Berry curvature mechanism. Additionally, we demonstrate the ability to achieve a sizable spin-mixing conductance (34.7 nm$^{-2}$) and an exceptionally high interfacial spin transparency of 88$%$ in this heterostructure, underlining its potential for spin-orbit torque switching applications. Overall, this study broadens the scope of topological spintronics, emphasizing the controlled interfacial spin-transport processes and subsequent spin-to-charge conversion in a previously unexplored topological Dirac semimetal RhSi/ferromagnet heterostructure.

Emerging magnetic fields related to the presence of topologically protected spin textures such as skyrmions are expected to give rise to additional, topology-related contributions to the Hall effect. In order to doubtlessly identify this so-called topological Hall effect, it is crucial to disentangle such contributions from the anomalous Hall effect. This necessitates a direct correlation of the transversal Hall voltage with the underlying magnetic textures. We utilize a novel measurement platform that allows to acquire high-resolution Lorentz transmission electron microscopy images of magnetic textures as a function of an external magnetic field and to concurrently measure the (anomalous) Hall voltage in-situ in the microscope on one and the same specimen. We use this approach to investigate the transport signatures of the chiral soliton lattice and antiskyrmions in Mn$_{1.4}$PtSn. Notably, the observed textures allow to fully understand the measured Hall voltage without the need of any additional contributions due to a topological Hall effect, and the field-controlled formation and annihilation of anstiskyrmions are found to have no effect on the measurend Hall voltage.

The cubic $\beta$-Mn-type alloy Co$_8$Zn$_8$Mn$_4$ is a chiral helimagnet that exhibits a peculiar temperature-dependent behavior in the spiral pitch, which decreases from 130 nm at room temperature to 70 nm below 20 K. Notably, this shortening is also accompanied by a structural transition of the metastable skyrmion texture, transforming from a hexagonal lattice to a square lattice of elongated skyrmions. The underlying mechanism of these transformations remain unknown, with interactions potentially involved including temperature-dependent Dzyaloshinskii-Moriya interaction, magnetocrystalline anisotropy, and exchange anisotropy. Here, x-ray resonant magnetic small-angle scattering in vectorial magnetic fields was employed to investigate the temperature dependence of the anisotropic properties of the helical phase in Co$_8$Zn$_8$Mn$_4$. Our results reveal quantitatively that the magnitude of the anisotropic exchange interaction increases by a factor of 4 on cooling from room temperature to 20 K, leading to a 5% variation in the helical pitch within the (001) plane at 20 K. While anisotropic exchange interaction contributes to the shortening of the spiral pitch, its magnitude is insufficient to explain the variation in the spiral periodicity from room to low temperatures. Finally, we demonstrate that magnetocrystalline and exchange anisotropies compete, favoring different orientations of the helical vector in the ground state., Comment: 8 pages, 4 figures

Metal oxide (MO) semiconductors are widely used in electronic devices due to their high optical transmittance and promising electrical performance. This work describes the advancement toward an eco-friendly, streamlined method for preparing thin-film transistors (TFTs) via a pure water-solution blade-coating process with focus on a low thermal budget. Low temperature and rapid annealing of triple-coated indium oxide thin-film transistors (3C-TFTs) and indium oxide/zinc oxide/indium oxide thin-film transistors (IZI-TFTs) on a 300 nm SiO2 gate dielectric at 300 $^{\circ}$C for only 60 s yields devices with an average field effect mobility of 10.7 and 13.8 cm2/Vs, respectively. The devices show an excellent on/off ratio (>10^6), and a threshold voltage close to 0 V when measured in air. Flexible MO-TFTs on polyimide substrates with AlOx dielectrics fabricated by rapid annealing treatment can achieve a remarkable mobility of over 10 cm2/Vs at low operating voltage. When using a longer post-coating annealing period of 20 min, high-performance 3C-TFTs (over 18 cm2/Vs) and IZI-TFTs (over 38 cm2/Vs) using MO semiconductor layers annealed at 300 $^{\circ}$C are achieved.

We demonstrate a top-down fabricated reconfigurable field effect transistor (RFET) based on a silicon nanowire that can be electrostatically programmed to p- and n-configuration. The device unites a high symmetry of transfer characteristics, high on/off current ratios in both configurations and superior current densities in comparison to other top-down fabricated RFETs. Two NiSi2/Si Schottky junctions are formed inside the wire and gated individually. The narrow omega-gated channel is fabricated by a repeated SiO2 etch and growth sequence and a conformal TiN deposition. The gate and Schottky contact metal work functions and the oxide-induced compressive stress to the Schottky junction are adjusted to result in only factor 1.6 higher p- than n-current for in absolute terms identical gate voltages and identical drain voltages., Comment: Nanowires, Reconfigurable field effect transistors, Polarity control, Electrostatic doping, Silicon on insulator technology, Omega-gates, Multiple-gate devices