27 results on '"Sunwoo Heo"'
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2. ZnO composite nanolayer with mobility edge quantization for multi-value logic transistors
3. Tunable AC/DC converter using graphene-germanium barristor based half-wave rectifier
4. Graphene–ZnO:N barristor on a polyethylene naphthalate substrate
5. Demonstration of ternary devices and circuits using dual channel graphene barristors.
6. Design of Ratioless Ternary Inverter Using Graphene Barristor.
7. Non-destructive defect level analysis of graphene using amplitude-modulated discharge current analysis
8. Direct Defect-Level Analysis of Metal–Insulator–Metal Capacitor Using Internal Photoemission Spectroscopy
9. Dynamic band alignment modulation of ultrathin WOx/ZnO stack for high on/off ratio field-effect switching applications
10. Dynamic band alignment modulation of ultrathin WO
11. Ternary Full Adder Using Multi-Threshold Voltage Graphene Barristors
12. Pulsed KrF laser-assisted direct deposition of graphitic capping layer for Cu interconnect
13. Time Domain Reflectometry Analysis of the Dispersion of Metal–Insulator–Metal Capacitance
14. Demonstration of ternary devices and circuits using dual channel graphene barristors
15. Reliability characteristics of MIM capacitor studied with ΔC-F characteristics
16. High-pressure oxygen annealing of Al
17. Graphene-ZnO:N Schottky junction based thin film transistor
18. Tunable AC/DC converter using graphene-germanium barristor based half-wave rectifier
19. Graphene Photodetectors: High‐Responsivity Near‐Infrared Photodetector Using Gate‐Modulated Graphene/Germanium Schottky Junction (Adv. Electron. Mater. 6/2019)
20. Advantages of a buried-gate structure for graphene field-effect transistor
21. Design of Ratioless Ternary Inverter Using Graphene Barristor
22. Very-Low-Temperature Integrated Complementary Graphene-Barristor-Based Inverter for Thin-Film Transistor Applications
23. Dielectric Dispersion and High Field Response of Multilayer Hexagonal Boron Nitride
24. Gate-Controlled Graphene-Silicon Schottky Junction Photodetector
25. High-pressure oxygen annealing of Al2O3passivation layer for performance enhancement of graphene field-effect transistors
26. Advantages of a buried-gate structure for graphene field-effect transistor.
27. High-pressure oxygen annealing of Al2O3 passivation layer for performance enhancement of graphene field-effect transistors.
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