Interest in improving energy security and reducing carbon emissions have led to significant investment in renewable power generation such as wind and solar. However, the intermittent nature of these energy sources necessitates the implementation of grid-level energy storage systems to provide the base-line power that is currently provided by non-renewable sources (coal, nuclear, etc.) Significant investment in improved transmission capability (e.g. high-voltage DC) will also be required to deliver power from potentially remote generation and storage locations to heavily-populated urban areas where demand is highest. Portable energy storage systems are also likely to play a role. Power electronics is the common element linking energy generation, storage, and consumption. For example, inverters are required to transform DC power from photovoltaic arrays or battery-based storage into AC power suitable for grid transmission, and Flexible AC Transmission Systems (FACTS) are necessary to efficiently control the flow of power in a “smart grid” implementation [1]. Power semiconductor switching devices are at the heart of all power electronics systems. While Si-based devices have been effectively utilized for many years, emerging devices based on the wide-bandgap semiconductor Gallium Nitride (GaN) offer potentially disruptive improvements in efficiency, thermal management, and system complexity. Several DOEsponsored programs at Sandia National Laboratories are currently addressing the issues associated with the implementation of wide-bandgap power electronics from the systems level, through the circuit and device level, down to the material and atomic level, where we investigate the fundamental defects responsible for performance and reliability of this emerging technology. This talk will thus be in two parts. The first part will discuss the systems-level motivation for moving to widebandgap power devices, while the second part will discuss some of the detailed work we are doing to solve the reliability problems currently facing GaN-based power devices. GaN has been a popular and extensively studied material for Radio-Frequency (RF) applications. RF AlGaN/GaN High Electron Mobility Transistors (HEMTs) aim to achieve large piezoelectric polarization and the highest possible channel density by utilizing a high Al molefraction in the AlGaN barrier layer. However, for power devices, achieving high breakdown voltage is not possible with very high channel electron density. Also, the high mechanical strain due to large lattice mismatch is detrimental to device reliability under the harsh operating conditions of a power device. Therefore, a reduced Al molefraction becomes necessary to adapt the AlGaN/GaN HEMT to high-power applications. In this work, the effects of reducing the Al molefraction in the AlGaN layer on the charge trapping behavior (and hence the stability) of the device are studied. This charge trapping is recoverable, and is thus distinct from reported permanent failure modes such as the inverse piezoelectric effect [2]. The effect of surface passivation and the interplay of surface charge on breakdown voltage is a key factor in the optimization of the design and processing of the device. HEMTs utilizing Al0.15Ga0.85N and Al0.26Ga0.74N barriers, both with and without surface passivation, are studied. Various experimental techniques are utilized to characterize charge trapping centers in the devices. Previous studies have shown the presence of multiple trapping and detrapping components in AlGaN/GaN systems [3]. For relatively shallow traps, the current-transient-based multiple exponential method [4] is employed (Figure 1). For deeper traps, emission following exposure to monochromatic light of variable wavelength is used (Figure 2). Additionally, the spatial location of charge traps is studied by measuring the surface potential within the device using Kelvin Force Microscopy (KFM). The combination of these techniques provides a comprehensive picture of the traps responsible for electrical degradation and instability in AlGaN/GaN power HEMTs. Such instability is one failure mechanism that ultimately limits the implementation of these GaNbased devices in grid-level power switching applications.