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A major challenge in nanotechnology is the fabrication of complex three-dimensional (3D) structures with desired materials. We present a strategy for fabricating arbitrary 3D nanostructures with a library of materials including metals, metal alloys, 2D materials, oxides, diamond, upconversion materials, semiconductors, polymers, biomaterials, molecular crystals, and inks. Specifically, hydrogels patterned by femtosecond light sheets are used as templates that allow for direct assembly of materials to form designed nanostructures. By fine-tuning the exposure strategy and features of the patterned gel, 2D and 3D structures of 20- to 200-nm resolution are realized. We fabricated nanodevices, including encrypted optical storage and microelectrodes, to demonstrate their designed functionality and precision. These results show that our method provides a systematic solution for nanofabrication across different classes of materials and opens up further possibilities for the design of sophisticated nanodevices.

The limited throughput of nano-scale laser lithography has been the bottleneck for its industrial applications. Although using multiple laser foci to parallelize the lithography process is an effective and straightforward strategy to improve rate, most conventional multi-focus methods are plagued by non-uniform laser intensity distribution due to the lack of individual control for each focus, which greatly hinders the nano-scale precision. In this paper, we present a highly uniform parallel two-photon lithography method based on a digital mirror device (DMD) and microlens array (MLA), which allows the generation of thousands of femtosecond (fs) laser foci with individual on-off switching and intensity-tuning capability. In the experiments, we generated a 1,600-laser focus array for parallel fabrication. Notably, the intensity uniformity of the focus array reached 97.7%, where the intensity-tuning precision for each focus reached 0.83%. A uniform dot array structure was fabricated to demonstrate parallel fabrication of sub-diffraction limit features, i.e., below 1/4 λ or 200 nm. The multi-focus lithography method has the potential of realizing rapid fabrication of sub-diffraction, arbitrarily complex, and large-scale 3D structures with three orders of magnitude higher fabrication rate.

In this Letter, we present a holography-based structured light illumination (SLI) method to enhance the resolution of widefield temporal focusing microscopy (TFM). In the system, a digital micromirror device is employed to simultaneously disperse the incoming femtosecond laser to induce temporal focusing at the focal plane and generate designed structured patterns via a Lee hologram. As the generated structured patterns do not contain the zeroth order beam, it improves the contrast and modulation frequency. Mathematical models have been derived to calculate the electric fields at the focal plane and to explain the effects of improved optical cross-sectioning capability. Imaging experiments have been devised and performed on fluorescent beads and mouse kidney sections; the results demonstrate enhanced axial confinement and improved suppression of out-of-focus fluorescence. The new SLI method realizes high-resolution TFM and can be readily applied to other microscopy platforms for biophotonics applications.

Binary holography has been applied with fast switching digital masks, e.g., digital micromirror device (DMD), to modulate light in recent years for a wide range of optical and scientific applications, such as trapping of cold atoms and 3D random-access two-photon fluorescence microscopy. However, the binarized modulation errors associated with the effect of discrete sampling, finite pixels, and intrinsic noises of algorithms have yet to be systematically investigated. In this paper, we present the development of an analytical model for a general binary mask with finite pixels. The model has established a deterministic link between the quality of the reconstructed wavefront to important parameters of the binary mask, including pixel size, pixel geometry, fill factor, and aperture. Based on the model, three case studies are presented, including (1) beam shaping, (2) 3D random-access scanning, and (3) multi-focus generation based on binary masks. The results show the model can precisely predict the wavefront distortion, power efficiency, position accuracy, and intensity uniformity for multi-focus generation as a function of binary mask parameters. As digital systems are highly repeatable, the predicted errors, e.g., position errors, can be compensated by adding appropriate phase to the designed holograms. The model and the simulation results may provide useful guidance to select appropriate binary devices and optimization algorithms for specific optical engineering applications, e.g., nanofabrication or nonlinear microscopy.

We present the modular design and characterization of a multi-modality video-rate two-photon excitation (TPE) microscope based on integrating a digital micromirror device (DMD), which functions as an ultrafast beam shaper and random-access scanner, with a pair of galvanometric scanners. The TPE microscope system realizes a suite of new imaging functionalities, including (1) multi-layer imaging with 3D programmable imaging planes, (2) DMD-based wavefront correction, and (3) multi-focus optical stimulation (up to 22.7 kHz) with simultaneous TPE imaging, all in real-time. We also report the detailed optomechanical design and software development that achieves high level system automation. To verify the performance of different microscope functions, we have devised and performed imaging experiments on Drosophila brain, mouse kidney and human stem cells. The results not only show improved imaging resolution and depths via the DMD-based adaptive optics, but also demonstrate fast multi-focus stimulation for the first time. With the new imaging capabilities, e.g., tools for optogenetics, the multi-modality TPE microscope may play a critical role in the applications pertinent to neuroscience and biophotonics.

The recovery of obscured objects is an important goal in imaging that has been approached by exploiting coherence properties, ballistic photons, and penetrating wavelengths. In this paper, a robust reconstruction non-line-of-sight (NLOS) algorithm was proposed based on the Bayesian statistics, using the temporal, spatial, and intensity information of each signal. Compared with conventional back-projection methods, this algorithm is able to handle random errors in data and to image occluded objects with a higher quality. An adjustable compensation mechanism in our method is effective in dealing with the diversity of objects with regard to reflective characteristics. Our algorithm was demonstrated to be efficient with both simulated and experimental data. In addition, we discuss the advantages over existing methods and further improvement of the proposed algorithm.