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9 results on '"Skalsey, Mark"'

1. Experimental Tests of QED in Positronium: Recent Advances

Author

Conti, Ralph S., Vallery, Richard S., Gidley, David W., Engbrecht, Jason J., Skalsey, Mark, Zitzewitz, Paul W., Beig, R., editor, Ehlers, J., editor, Frisch, U., editor, Hepp, K., editor, Hillebrandt, W., editor, Imboden, D., editor, Jaffe, R. L., editor, Kippenhahn, R., editor, Lipowsky, R., editor, Löhneysen, H. v., editor, Ojima, I., editor, Weidenmüller, H. A., editor, Wess, J., editor, Zittartz, J., editor, Karshenboim, Savely G., editor, Bassani, F., editor, Pavone, F.S., editor, Inguscio, M., editor, and Hänsch, T.W., editor

Published
2001
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5. Pore Sealing by NH3 Plasma Treatment of Porous Low Dielectric Constant Films.

Author

Hua-Gen Peng, Dong-Zhi Chi, Wei-De Wang, Jing-Hui Li, Kai-Yang Zeng, Vallery, Richard S., Frieze, William E., Skalsey, Mark A., Gidley, David W., and Yee, Albert F.

Subjects
SEALING (Technology), POROUS materials, DIELECTRIC films, INTEGRATED circuits, DIFFUSION, POSITRONIUM, ANNIHILATION reactions, ANALYTICAL chemistry, SPECTRUM analysis, SPUTTERING (Physics), ELECTROCHEMICAL research
Abstract

Porous interlayer dielectric films with interconnected pores pose a serious challenge for their integration into next-generation microchips. The opening of interconnected pores in the surface region needs to be sealed to prevent intrusion of atomic layer deposition precursors used to create metal diffusion barriers. In this paper, we report the formation of a thin, nonporous surface layer on a porous methyl-silsesquloxane-based dielectric film by NH3 plasma treatment. Depth-profiled beam positronium annihilation lifetime spectroscopy was applied to conveniently examine the formation of the dense layer. A nonporous surface layer was readily identified by the curtailment of positronium escape into vacuum through the surface. Among plasma treatments at temperatures ranging from 25 to 300°C for duration of 3-600 s, the best result was achieved at 300°C for 10 s. A very thin skin layer, ~10 nm, could be formed with little damage to the bulk of the low-k film. This thin skin layer further proved to improve the performance of Ta barriers for Cu diffusion. Chemical analysis, infrared spectroscopy, and sputtering secondary ion mass spectroscopy were also performed to examine how the plasma treatment altered the dielectric film. [ABSTRACT FROM AUTHOR]

Published
2007
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8. The Development of a New Positron Polarimeter and the Precision Measurement of the Polarization of Positrons from the Decay of Sodium-22.

Author

Skalsey, Mark A.

Abstract

This dissertation describes the development and first use of a new, high efficiency spin polarimeter system for relative measurements of positron longitudinal polarization. This system consists of a magnetic spectrometer which delivers to the polarimeter a nearly monoenergetic beam of positrons arising from radioactive sources. The polarimeter operation is based on the formation of positronium in an external magnetic field which perturbs the positronium spin states. A discussion of systematic uncertainties affecting the polarimeter system is presented including estimates, calculations, and measurements of all known effects. As a feasibility test of the polarimeter operation, the longitudinal polarization of positrons in ('22)Na decay was measured relative to ('68)Ga, which served as a "normalizing" source, with the result: P(,l)(('22)Na) = (+1.003 (+OR-) 0.011)(beta), consistent with P(,l) = (beta). The quoted error includes statistical and systematic errors. The theoretical implications of this measurement are analyzed with respect to anomalously low measurements of the electron-capture to position-emission ratio in the decay of ('22)Na. The impact of future applications of this new polarimeter in the exploration of weak interaction phenomena is discussed, and several suggested experiments are described in detail.

Published
1982

9. Pore Sealing by NH3Plasma Treatment of Porous Low Dielectric Constant Films

Author

Peng, Hua-Gen, Chi, Dong-Zhi, Wang, Wei-De, Li, Jing-Hui, Zeng, Kai-Yang, Vallery, Richard S., Frieze, William E., Skalsey, Mark A., Gidley, David W., and Yee, Albert F.

Abstract

Porous interlayer dielectric films with interconnected pores pose a serious challenge for their integration into next-generation microchips. The opening of interconnected pores in the surface region needs to be sealed to prevent intrusion of atomic layer deposition precursors used to create metal diffusion barriers. In this paper, we report the formation of a thin, nonporous surface layer on a porous methyl-silsesquioxane-based dielectric film by NH3plasma treatment. Depth-profiled beam positronium annihilation lifetime spectroscopy was applied to conveniently examine the formation of the dense layer. A nonporous surface layer was readily identified by the curtailment of positronium escape into vacuum through the surface. Among plasma treatments at temperatures ranging from 25 to 300°Cfor duration of 3–600s, the best result was achieved at 300°Cfor 10s. A very thin skin layer, ∼10nm, could be formed with little damage to the bulk of the low-κ film. This thin skin layer further proved to improve the performance of Ta barriers for Cu diffusion. Chemical analysis, infrared spectroscopy, and sputtering secondary ion mass spectroscopy were also performed to examine how the plasma treatment altered the dielectric film.

Published
2007
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