Search

Scanning electron microscopy (SEM) is a perfect technique for micro-/nano-object imaging [1] and movement measurement [2, 3] both in high and environmental vacuum conditions and at various temperatures ranging from elevated to low temperatures. In our view, the magnetic field expanding from the pole-piece makes it possible to characterize the behaviour of electromagnetic micro- and nano electromechanical systems (MEMS/NEMS) in which the deflection of the movable part is controlled by the electromagnetic force. What must be determined, however, is the magnetic field expanding from the e-beam column, which is a function of many factors, like working distance (WD), magnification and position of the device in relation to the e-beam column. There are only a few experimental methods for determination of the magnetic field in a scanning electron microscope. In this paper we present a method of the magnetic field determination under the scanning electron column by application of a silicon cantilever magnetometer. The micro-cantilever magnetometer is a silicon micro-fabricated MEMS electromagnetic device integrating a current loop of lithographically defined dimensions. Its stiffness can be calibrated with a precision of 5% by the method described by Majstrzyk et al. [4]. The deflection of the magnetometer cantilever is measured with a scanning electron microscope and thus, through knowing the bias current, it is possible to determine the magnetic field generated by the e-beam column in a defined position and at a defined magnification.

Copyright of Przegląd Elektrotechniczny is the property of Przeglad Elektrotechniczny and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)

In this paper, we present metrology and control methods and techniques for electromagnetically actuated microcantilevers. The electromagnetically actuated cantilevers belong to the micro electro mechanical systems (MEMS), which can be used in high resolution force and mass change investigations. In the described experiments, silicon cantilevers with an integrated Lorentz current loop were investigated. The electromagnetically actuated cantilevers were characterized using a modified optical beam deflection (OBD) system, whose architecture was optimized in order to increase its resolution. The sensitivity of the OBD system was calibrated using a reference cantilever, whose spring constant was determined through thermomechanical noise analysis registered interferometrically. The optimized and calibrated OBD system was used to observe the resonance and bidirectional static deflection of the electromagnetically deflected cantilevers. After theoretical analysis and further experiments, it was possible to obtain setup sensitivity equal to 5.28 mV/nm. [ABSTRACT FROM AUTHOR]

Copyright of Journal of Machine Construction & Maintenance is the property of Institute for Sustainable Technologies - National Research Institute and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)

This paper presents a method of characterization micro- and nanostructures defined in a photolithography process. To implement this method a measurement system composed of an atomic force microscope (AFM) integrated with a system for maskless lithography was developed. This integration enables exposed patterns to be examined in situ, without any necessity for a developing process. The microscope works in a shear force mode, uses a cantilever with a piezoresistive method of detecting deflection and can be used for measuring surfaces with high aspect ratio by applying an appropriate technology of sharpening in a focused ion beam process. The cantilever fabrication process, its calibration and examination procedures are presented. Finally, the AFM images of structures scanned directly after exposure are shown. [ABSTRACT FROM AUTHOR]

Abstract: In this paper we propose a method for linearization of split-diode photodetector''s readout characteristics in optical beam deflection (OBD) system. By assumption of an invertible function-shaped laser spot''s optical power cumulative distribution, relation between detector''s output signal and the cantilever''s bending can be found. A microstage and electromagnetically actuated microcantilevers are used to characterize the detector and establish model''s parameters. After linearization, differential signal from a 2-cantilever array is used to prove linearity of the system. [Copyright &y& Elsevier]