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12. Fabrication and Characterization of In 0.53 Ga 0.47 As/InAs/In 0.53 Ga 0.47 As Composite Channel Metamorphic HEMTs (mHEMTs) on a GaAs Substrate.

13. Demonstration of High Performance Flexible In 0.7 Ga 0.3 As MOSFETs Using Liquid Polyimide (LPI) Transfer.

17. Impact of Ground Plane Doping and Bottom-Gate Biasing on Electrical Properties in In0.53Ga0.47As-OI MOSFETs and Donor Wafer Reusability Toward Monolithic 3-D Integration With In0.53Ga0.47As Channel

23. Heterogeneous Integration Toward a Monolithic 3-D Chip Enabled by III–V and Ge Materials

24. Heterogeneous integration toward monolithic 3D chip

29. Effects of high-dose gamma-ray irradiation on an In0.53Ga0.47As high electron mobility transistor

44. Fabrication and Characterization of In 0.53 Ga 0.47 As/InAs/In 0.53 Ga 0.47 As Composite Channel Metamorphic HEMTs (mHEMTs) on a GaAs Substrate.

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