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1. Controlled placement of nanoscale building blocks: Toward large-scale fabrication of nanoscale devices

2. Electrostatic Funneling for Precise Nanoparticle Placement: A Route to Wafer-Scale Integration

3. Energy-filtered cold electron transport at room temperature

4. Stochastic ripening of one-dimensional nanostructures

5. Pair- and many-atom interactions in the cohesion of surface clusters:PdxandIrxon W(110)

6. Many-atom effects in the cohesion of overlayers: iridium on W(110)

7. Fabrication of Single Electron Devices within the Framework of CMOS Technology

8. CMOS-compatible fabrication of room-temperature single-electron devices

9. Strategies for Controlled Placement of Nanoscale Building Blocks

10. Atomic jumps in surface self-diffusion: W on W(110)

11. Non-Nearest-Neighbor Jumps in 2D Diffusion: Pd on W(110)

12. Self-Assembly of One-Dimensional Surface Structures: Long-Range Interactions in the Growth of Ir and Pd on W(110)

13. Atomic Interactions and the Stability of Surface Clusters

14. Formation of TiSi2 During Rapid Thermal Annealing: In Situ Resistance Measurements at Heating Rates From 1°C/S to 100°C/S

16. Single-particle placement via self-limiting electrostatic gating

17. CMOS-compatible fabrication of room-temperature single-electron devices.

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