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Your search keyword '"Schmiedeskamp, B."' showing total 130 results
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130 results on '"Schmiedeskamp, B."'

4. Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors

Author

Stock, H.-J., Hamelmann, F., Kleineberg, U., Menke, D., Schmiedeskamp, B., Osterried, K., Heidemann, K.F., and Heinzmann, U.

Subjects
Mirrors -- Research, X-rays -- Research, Surface roughness -- Research, Astronomy, Physics
Abstract

Zerodur and BK7 glass substrates (developed by Fa. Glaswerke Schott, D-55014 Mainz, Germany) from Carl Zeiss Oberkochen polished to a standard surface roughness of [Sigma] = 0.8 nm rms were coated with a C layer by electron-beam evaporation in the UHV. The roughness of the C-layer surfaces is reduced to 0.6 nm rms. A normal-incidence reflectance of 50% at a wavelength of 13 nm was measured for a Mo/Si multilayer soft-x-ray mirror with 30 double layers (N = 30) deposited onto the BK7/C substrate, whereas a similar Mo/Si multilayer (N = 30) evaporated directly onto the bare BK7 surface turned out to show a reflectance of only 42%.

Published
1997

6. Mo/Si multilayer-coated ruled blazed gratings for the soft-x-ray region

Author

Kleineberg, U., Osterried, K., Stock, H.-J., Menke, D., Schmiedeskamp, B., Fuchs, D., Muller, P., Scholze, F., Heidemann, F., Nelles, B., and Heinzmann, U.

Subjects
Diffraction gratings -- Design and construction, X-ray microscope -- Equipment and supplies, Astronomy, Physics
Published
1995

21. Fabrication and characterization of Si-based soft x-ray mirrors

Author

Schmiedeskamp, B., Heidemann, B., Kleineberg, U., Kloidt, A., Kühne, M., Müller, H., Müller, P., Nolting, K., Heinzmann, Ulrich, and Hoover, Richard B.

Abstract

Silicon-metal multilayers, which are designed as soft x-ray mirrors, have been fabricated with e – beam evaporation in Bielefeld. Quartz oscillators and in situ soft x-ray reflection with C-k radiation were applied to control the fabrication process. The Mo/Si and Ta/Si layer systems were fabricated for wavelengths between 12 and 30nm and normal radiation incidence. They were studied with synchrotron radiation soft x-ray reflection in the PTB laboratory at BESSY in Berlin and with Cu-K[alpha] reflection as well as the surface analytical methods Rutherford-Backscattering (RBS) and Sputtering in combination with Auger electron spectroscopy (Sputter/AES) in Bielefeld. The optical data, C-k in situ reflectivity, Cu-k[alpha] and synchrotron radiation reflection, are compared with calculations on the basis of the Fresnel equations. Tests were made with RBS and Sputter/AES to prove their suitability for a study of the multilayer microstructures and their changes after thermal treatments.

Published
1991

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