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We report on the magnetoresistance (MR) properties of [[Co(tCo)/Ag 1.5 nm].sub.20] multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 [cm.sup.2]). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [[Co 1.5 nm/Ag 1.5 nm].sub.20] showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves. Index Terms--Anisotropy, Co/Ag, magnetoresistance, multilayer, pulse electrodeposition.