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231 results on '"Reichmanis, E."'

2. Consensus statement: Standardized reporting of power-producing luminescent solar concentrator performance

Author

Yang, C, Atwater, HA, Baldo, MA, Baran, D, Barile, CJ, Barr, MC, Bates, M, Bawendi, MG, Bergren, MR, Borhan, B, Brabec, CJ, Brovelli, S, Bulovic, V, Ceroni, P, Debije, MG, Delgado-Sanchez, J-M, Dong, W-J, Duxbury, PM, Evans, RC, Forrest, SR, Gamelin, DR, Giebink, NC, Gong, X, Griffini, G, Guo, F, Herrera, CK, Ho-Baillie, AWY, Holmes, RJ, Hong, S-K, Kirchartz, T, Levine, BG, Li, H, Li, Y, Liu, D, Loi, MA, Luscombe, CK, Makarov, NS, Mateen, F, Mazzaro, R, McDaniel, H, McGehee, MD, Meinardi, F, Menendez-Velazquez, A, Min, J, Mitzi, DB, Moemeni, M, Moon, JH, Nattestad, A, Nazeeruddin, MK, Nogueira, AF, Paetzold, UW, Patrick, DL, Pucci, A, Rand, BP, Reichmanis, E, Richards, BS, Roncali, J, Rosei, F, Schmidt, TW, So, F, Tu, C-C, Vahdani, A, van Sark, WGJHM, Verduzco, R, Vomiero, A, Wong, WWH, Wu, K, Yip, H-L, Zhang, X, Zhao, H, Lunt, RR, Yang, C, Atwater, HA, Baldo, MA, Baran, D, Barile, CJ, Barr, MC, Bates, M, Bawendi, MG, Bergren, MR, Borhan, B, Brabec, CJ, Brovelli, S, Bulovic, V, Ceroni, P, Debije, MG, Delgado-Sanchez, J-M, Dong, W-J, Duxbury, PM, Evans, RC, Forrest, SR, Gamelin, DR, Giebink, NC, Gong, X, Griffini, G, Guo, F, Herrera, CK, Ho-Baillie, AWY, Holmes, RJ, Hong, S-K, Kirchartz, T, Levine, BG, Li, H, Li, Y, Liu, D, Loi, MA, Luscombe, CK, Makarov, NS, Mateen, F, Mazzaro, R, McDaniel, H, McGehee, MD, Meinardi, F, Menendez-Velazquez, A, Min, J, Mitzi, DB, Moemeni, M, Moon, JH, Nattestad, A, Nazeeruddin, MK, Nogueira, AF, Paetzold, UW, Patrick, DL, Pucci, A, Rand, BP, Reichmanis, E, Richards, BS, Roncali, J, Rosei, F, Schmidt, TW, So, F, Tu, C-C, Vahdani, A, van Sark, WGJHM, Verduzco, R, Vomiero, A, Wong, WWH, Wu, K, Yip, H-L, Zhang, X, Zhao, H, and Lunt, RR

Published
2022

5. Effect of post-exposure delay in positive acting chemically amplified resists: an analytical study

Author

Nalamasu, O., Reichmanis, E., Hanson, J.E., Kanga, R.S., Heimbrook, L.A., Emerson, A.B., Baiocchi, F.A., and Vaidya, S.

Subjects
Photoresists -- Analysis, Photopolymers -- Research, Engineering and manufacturing industries, Science and technology
Abstract

The lithographic performance of chemically amplified positive resists depends on controlling the delay time between the exposure and post-exposure bake (PEB) process steps. The effect of post-exposure delay (PED) was investigated in poly(t-butoxycarbonyloxystyrene-sulfone) formulated with photoacid generators (PAG) by a variety of analytical techniques including Rutherford backscattering, infrared, X-ray photoelectron and laser ablation microprobe mass spectrometry. The results indicate that the base-insoluble residue formed during PED is primarily a surface phenomenon and is a result of incomplete deprotection at the resist surface. It was determined that ppb levels of basic vapors present in the resist processing environment affect process performance profoundly by reacting with the photogenerated acids during PED. Isolation of resist surface from the immediate environment by means of a thin, acidic, and base-soluble overcoat (covercoat) material dramatically alleviates the environmental effects by quenching basic airborne contaminants and improves PED latitude.

Published
1992

6. Arylmethyl sulfones: a new class of photoacid generators

Author

Novembre, A.E., Hanson, J.E., Kometani, J.M., Tai, W.W., Reichmanis, E., and Thompson, L.F.

Subjects
Sulfones -- Research, Photoresists -- Research, Crosslinked polymers -- Research, Engineering and manufacturing industries, Science and technology
Abstract

The X-ray and deep UV radiation response is described for resist systems consisting of poly(4-tert-butoxycarbonyloxystyrene-co-sulfur dioxide) PTBSS combined with an arylmethyl sulfone. A 2:1 4-tert-butoxycarbonyloxystyrene (TBS): sulfur dioxide (SO (sub 2)) resist has been found to function as a highly sensitive, 1.4 nm X-ray, single-component, chemically amplified resist. The same resist, however, exhibits reduced sensitivity to 0.8 nm X-rays and deep UV (248 nm) radiation. Improvement in 0.8 nm X-ray sensitivity is achieved by the addition of 12 mol% bis(3,4-dichlorobenzyl) sulfone (DCBS) to the 2:1 TBS:SO (sub 2) resist. For this two-component resist formulation, the 0.8 nm X-ray sensitive improved from > 375 to 125 mJ/cm squared. Similarly, the sensitivity of the 3:1 TBS:SO (sub 2) copolymer to deep UV radiation improves to 40 mJ/cm squared with addition of 10 mol% DCBS. Sulfones, such as DCBS, provide two-component resist formulations capable of < 0.5 micro-m resolution.

Published
1992

11. An Electrifying Choice for the 2019 Chemistry Nobel Prize: Goodenough, Whittingham, and Yoshino

Author

Bredas, J-L, Buriak, JM, Caruso, F, Choi, K-S, Korgel, BA, Palacin, MR, Persson, K, Reichmanis, E, Schuth, F, Seshadri, R, Ward, MD, Bredas, J-L, Buriak, JM, Caruso, F, Choi, K-S, Korgel, BA, Palacin, MR, Persson, K, Reichmanis, E, Schuth, F, Seshadri, R, and Ward, MD

Abstract

As editors of a materials chemistry journal, we are thrilled at the awarding of the 2019 Nobel Prize in Chemistry to John B. Goodenough, M. Stanley Whittingham, and Akira Yoshino, for their contributions that have led to the modern lithium ion battery (Figure 1). As the Nobel Prize Committee states succinctly, “They created a rechargeable world.”(1) The commercial and societal rewards of experimental research typically require decades to reach fruition, and lithium ion batteries were no different, with crucial leads dating back to the 1960s, and even earlier.(2) Materials chemistry journals only emerged 30 years ago with the advent of Chemistry of Materials, the Journal of Materials Chemistry, and Advanced Materials in 1989. Much of the earlier work in battery materials appeared beforehand in electrochemistry, physics, and solid state journals. The key fundamental discovery underpinning the lithium ion battery was the understanding and application of ion intercalation, in this case,(3) lithium ions inserted between the layers in graphite, metal sulfides, and, eventually, oxides that were commercialized. This Nobel Prize was evenly split three ways because, as the Nobel committee correctly observed, the contributions of all three inventors were essential to the success of the commercialization of the lithium ion battery.

Published
2019

17. New polysiloxanes for chemically amplified resist applications

Author

vandeGrampel, JC, Puyenbroek, R, Meetsma, A, Rousseeuw, BAC, vanderDrift, EWJM, Reichmanis, E, Ober, CK, MacDonald, SA, Iwayanagi, T, Nishikubo, T, and Solid State Materials for Electronics

Subjects
ELECTRON-BEAM LITHOGRAPHY, DESIGN, DEEP ULTRAVIOLET, NEGATIVE RESIST, CATIONIC POLYMERIZATION, PERFORMANCE, POLYMERS, MICROLITHOGRAPHY
Abstract

New polymers have been developed for application in bilayer resist systems. The products are sensitive for e-beam and DW exposure via chemical amplification and contain both silicon and acid-labile groups. Incorporation of silicon, necessary for a high resistance to reactive ion etching (RIE) in oxygen plasmas, was achieved by polysiloxanes present either as graft or as main chain units. Graft copolymers were prepared by radical polymerization involving styrene and methacrylate derivatives and silicon-containing macromers. In polymers where silicon is incorporated in the main chain, acidlabile groups were coupled to the siloxane chain by means of hydrosilylation starting from a poly(methylhydrosiloxane) and compounds possessing an unsaturated organic moiety. t-Butoxycarbonyloxy groups and epoxy groups were introduced as acid-labile moieties. To raise the glass transition temperatures of the systems studied bulky side-groups were attached to the polymer chain. In another approach acid-labile groups are attached to a rigid poly(phenylsilsesquioxane) framework. Depending on the developer used the polymers showed positive or negative images. In particular graft copolymers with t-butoxycarbonyloxy groups appeared to be very suitable as resists in DW and e-beam exposure experiments.

Published
1995

18. The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid

Author

Houlihan, F.M., Neenan, T.X., Chin, E., Reichmanis, E., and Kometani, J.M.

Subjects
Esters -- Research, Biosynthesis -- Research, Photoresists -- Research, Photochemical research -- Models, Engineering and manufacturing industries, Science and technology
Abstract

Methodology was developed for the synthesis of novel 2-substituted o-nitrobenzyl chromophores, which were derivatized as the tosylate esters. The thermal stabilities of these new tosylates fell within the range predicted from an empirical model. Lithographic sensitivities of deep UV resists made from these new esters and poly(4-(tert-butoxycarbonyloxy)styrene-sulfone) ranged from 45 to 90 mJ/cm squared.

Published
1992

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