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1. Influence of aluminum addition on structure, hardness, and oxidation resistance of Ta1−xAlxN thin films.

2. High-quality dense ZnO thin films: work function and photo/electrochemical properties.

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3. Colloidal Titanium Nitride Nanoparticles by Laser Ablation in Solvents for Plasmonic Applications.

4. Reactive Magnetron Sputtering for Y-Doped Barium Zirconate Electrolyte Deposition in a Complete Protonic Ceramic Fuel Cell.

5. Microstructure evolution and mechanical behavior of magnetron sputtering AlN–Al nanostructured composite film.

6. Power effect on the properties of copper nitride films as solar absorber deposited in pure nitrogen atmosphere.

7. Influence of the Annealing Environment on the Structure and Ferroelectric Properties of Lead Titanate Thin Films.

8. Colloidal Titanium Nitride Nanoparticles by Laser Ablation in Solvents for Plasmonic Applications

9. Plasmonic TiN, ZrN, and HfN Nanofluids for Solar-to-Heat Conversion.

10. Effects of Deposition Temperature and Working Pressure on the Thermal and Nanomechanical Performances of Stoichiometric Cu 3 N: An Adaptable Material for Photovoltaic Applications.

11. Application of Optical Emission Spectroscopy for Predicting the Composition of Films in Reactive Magnetron Sputtering of Ti–Al Composite Targets.

12. Model of Reactive Magnetron Sputtering of a Two-Component Composite Target

13. Reactive Magnetron Sputtering for Y-Doped Barium Zirconate Electrolyte Deposition in a Complete Protonic Ceramic Fuel Cell

14. Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering

15. Thermal Stability of Oxidation-Resistant Ta-Zr-Si-B-N and Ta-Zr-Si-B-C Coatings under In Situ TEM Heating and Vacuum Annealing.

16. Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO 2 Thin Films Grown by DC Reactive Magnetron Sputtering.

17. Electrospun Poly-L-Lactic Acid Scaffolds Surface-Modified via Reactive Magnetron Sputtering Using Different Mixing Ratios of Nitrogen and Xenon.

18. Effect of nitrogen concentration on titanium nitride thin film formation.

19. Morphological Evolution of La 2 NiO 4 Coatings Synthesized by Reactive Magnetron Sputtering (RMS) at High Pressure as Cathode for Intermediate Temperature Solid Oxide Fuel Cell (IT-SOFC).

20. Copper Nitride: A Versatile Semiconductor with Great Potential for Next-Generation Photovoltaics.

21. Influence of Magnetron Sputtering Parameters on Mechanical and Tribological Properties of Carbon Nitride Coatings.

22. Effect of the Nanorough Surface of TiO 2 Thin Films on the Compatibility with Endothelial Cells.

23. Formation of ZnO films on SiC/porous Si/Si substrates.

24. Reactive Magnetron Sputtering of Large‐Scale 3D Aluminum‐Based Plasmonic Nanostructure for Both Light‐Induced Thermal Imaging and Photo‐Thermoelectric Conversion.

25. Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfO x N y) Thin Films.

26. Homogeneity and Thermal Stability of Sputtered Al 0.7 Sc 0.3 N Thin Films.

27. Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition.

28. Impact of the RF Power on the Copper Nitride Films Deposited in a Pure Nitrogen Environment for Applications as Eco-Friendly Solar Absorber.

29. Применение оптической эмиссионной спектроскопии для прогнозирования состава пленок при реактивном магнетронном распылении Ti-Al составных мишеней.

30. Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001).

31. Thermochromic properties and surface chemical states of reactive magnetron sputtered vanadium oxide thin films at various deposition pressures.

32. Oxygen plasma-assisted magnetron sputtering deposition of non-stoichiometric Y2O3 films: Influence of oxygen vacancies on etching resistance.

33. Floating potential probes for process control during reactive magnetron sputtering.

34. Antiviral and antibacterial efficacy of nanocomposite amorphous carbon films with copper nanoparticles.

35. Effect of sputtering power and oxygen partial pressure on structural and opto-electronic properties of Al-doped ZnO transparent conducting oxides.

36. Preparation and characterization of chromium oxide thin films: The response of morphology, crystal structure, and electrical properties to oxygen pressure under magnetron sputtering.

37. Effects of Deposition Temperature and Working Pressure on the Thermal and Nanomechanical Performances of Stoichiometric Cu3N: An Adaptable Material for Photovoltaic Applications

38. OHMIC Losses on Magnetron-Sputtered PVD Thin-Film TCO Electrodes of the Electrochromic Modules During Their Tinting.

39. Integral Algorithms to Evaluate TiO 2 and N-TiO 2 Thin Films' Cytocompatibility.

40. Analysis of Tih x O y Films Produced by Physical Vapor Deposition Method.

41. Growth of Thin AlN Films on Si Wafers by Reactive Magnetron Sputtering: Role of Processing Pressure, Magnetron Power and Nitrogen/Argon Gas Flow Ratio.

42. Photoluminescence of combinatorically sputtered Al2O3–Y2O3 thin films with a Cr3+ and Nd3+ co-doping concentration gradient

44. Thermal Stability of Oxidation-Resistant Ta-Zr-Si-B-N and Ta-Zr-Si-B-C Coatings under In Situ TEM Heating and Vacuum Annealing

45. Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO2 Thin Films Grown by DC Reactive Magnetron Sputtering

46. Titania Thin Film Coated Glass for Simultaneous Ammonia Degradation and UV Light Blocking Layer in Photovoltaics.

47. Reactive Sputtered Ytterbium Silicate Environmental Barrier Coatings for Protection of Mo-Si-Based Alloys.

48. Formation and investigation of characteristics of thermoresistive structures based on vanadium oxide films

49. Achieving superior wear and corrosion resistance in FeCoNiCrNC films via nitrogen and carbon dual anions incorporation.

50. Modeling of the perovskite nickelate SmNiO3 nucleation from amorphous thin films: A Volmer's thermodynamical approach.