1. Synthesis of high-density carbon nanotube films by microwave plasma chemical vapor deposition
- Author
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R. Pcionek, David Tománek, U. Kim, and Dean M. Aslam
- Subjects
Nanotube ,Materials science ,Silicon ,Mechanical Engineering ,chemistry.chemical_element ,Substrate (chemistry) ,Nanotechnology ,General Chemistry ,Carbon nanotube ,Nitrogen ,Electronic, Optical and Magnetic Materials ,law.invention ,Chemical engineering ,chemistry ,law ,Plasma-enhanced chemical vapor deposition ,Materials Chemistry ,Electrical and Electronic Engineering ,Carbon ,Microwave - Abstract
Nanotubes with diameters ranging from 20 to 400 nm and densities in the range of 108–109 cm−2, produced on metal-coated silicon by microwave plasma chemical vapor deposition, show various shapes depending upon: (i) growth conditions; and (ii) pre- or post-growth treatment of the samples. Presence of nitrogen in the growth or pre-growth atmosphere increases the density and vertical growth rate of nanotubes. The growth rate on an iron-coated substrate is higher than on a nickel-coated substrate. A cleaning procedure, consisting of ultrasonic treatment of nanotubes in methanol, is demonstrated.
- Published
- 2001
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