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In this paper, the ferroelectric (FE) properties of 20-nm-thick Hf0.5Zr0.5O2 films deposited by an atomic layer deposition technique by using O3 or H2O as an oxygen source were studied. For both oxygen source, the Hf0.5Zr0.5O2 films exhibited the formation of a non-centrosymmetric orthorhombic phase, which was responsible for the FE behavior. However, it was shown that the H2O-based Hf0.5Zr0.5O2 films were more unsuitable for hydrogen from H2O than the O3-based Hf0.5Zr0.5O2 films, which reduced the FE polarization and increased the leakage behavior. The results indicated that the use of O3 as an oxygen source in the ALD process has potential for the fabrication of FE Hf0.5Zr0.5O2 films for next generation memory applications. [ABSTRACT FROM AUTHOR]

Reducing geometry size of lithium niobate (LN)-based photonic elements is imperative for realizing ultra-compact LN photonic systems with novel functionalities. However, precision fabrication of LN structures of tens-of-nanometers and below is a challenging task. Focused ion beam (FIB) is promising for ultra-smooth LN nano-patterning due to its flexibility and high resolution. However, tremendous surface roughness was left on the LN surface during FIB milling because of the inhomogenous etching of the metallic film, coated on LN surface to avoid charge accumulation. To achieve ultra-smooth patterns, in this paper, an organic conductive resist was used as an alternative to metallic films. The results showed that surface roughness was kept lower than 0.6 nm with etching depth from hundreds of nanometers to several nanometers. Ultra-shallow steps were fabricated on LN surface with controllable 10 nm step height. This work paves the way to the ultra-smooth and ultra-shallow FIB patterning of LN nano-structures. [ABSTRACT FROM AUTHOR]

Focused ion beam (FIB) milling has been used for fast prototyping of lithium niobate (LiNbO 3 , LN) devices with feature size from sub-to hundreds of micrometers. However, a promising and challenging depth range of tens-of-nanometers or below is rarely attended. Moreover, the surface roughness, related closely with device performances, is particularly non-negligible for such an ultra-shallow etching. Here, the surface roughness evolution was studied on ultra-shallow FIB etched LN structures. It was found that the inhomogeneous etching of the metallic film, coated on LN surface to avoid charge accumulation, had a detrimental effect on the LN surface roughness control. By thinning the gold thickness to 7 nm, sub-nanometer surface roughness was reported for etching depth of several nanometers. This work paves the way towards a homogenous and ultra-shallow FIB milling of LN nano-structures. • Investigation of etching depth and surface roughness evolution on focused ion beam milled lithium niobate (LN) surface. • Revealing the mechanism of non-negligible LN surface roughness especially in the ultra-shallow etching range. • The inhomogeneous etching of the pre-metallized coating had a detrimental effect on LN surface roughness control. • Several-nanometer ultra-shallow steps with surface roughness below 1 nm was presented on LN with a 7-nm-thick Au coating. [ABSTRACT FROM AUTHOR]

• We develop a shallow-etched grating coupler with high efficiency for diffractive waveguides based on the lithium niobate on insulator platform. The key parameter of the etching depth of grating is precisely designed to balance the coupling efficiency and minimize the damage to the waveguide. By controlling the etching depth at the level of more than one hundred nanometers, a coupling efficiency of 33.9 % is achieved in experiment. • Such compact structures realized by micro-nano fabrication technologies offer a flexible solution for achieving efficiently optical coupling at selectable locations on the surfaces of waveguides. • The diffractive waveguide demonstrates excellent input/output functions and the angle-dependent spectral modulation effect. These characteristic allow for the development of visualization glasses customized for angle-resolved spectroscopy, thereby greatly amplifying the adaptability and utility of AR glasses. Diffractive waveguide integrates both the light transmission, optical modulation and the signal input/output functions based on a waveguide structure etched with gratings. Such compact structures realized by micro-nano fabrication technologies offer a flexible solution for achieving efficiently optical coupling at selectable locations on the surfaces of waveguides, while the grating etching process will inevitably affect the original waveguide efficiency. Deep-etched gratings can achieve high coupling efficiency but may cause nonnegligible damage to the waveguide device. In this study, we develop a shallow-etched grating coupler with high efficiency for diffractive waveguides based on the lithium niobate on insulator platform. The key parameter of the etching depth of grating is precisely designed to balance the coupling efficiency and minimize the damage to the waveguide. By controlling the etching depth at the level of hundred nanometers, a coupling efficiency of 33.9 % is achieved in experiment. Moreover, the diffractive waveguide demonstrates excellent input/output functions and the angle-dependent spectral modulation effect. This work provides valuable insights for the design and optimization of grating couplers for augmented reality glasses. [ABSTRACT FROM AUTHOR]

Nanoparticles patterned on stretchable films for broad applications lack efficient fabrication methods. In this study, femtosecond laser-induced transfer was employed to assemble nanoparticles into a well-defined array on a flexible substrate while mitigating the inevitable plasmon resonances. The metal islands patterned on the substrate are regularly transferred as spherical nanoparticles onto the polymer, with a small deposition deviation and large embedded depth after laser irradiation. However, inhomogeneous laser absorption in the patterned array severely amplifies the printing deviation and narrows the process window, particularly for smaller patterns and complex arrangements. Plasmon resonance excited by an incident laser causes a localized optical field distribution, which accounts for absorption enhancement or suppression. The field distribution from the numerical simulation exhibited periodicity related to the laser parameters and array geometry. A theoretical model was established to clarify the propagation of plasmon resonance waves. The field distribution was modulated by adjusting the polarization direction, guided by theoretical and simulation analyses. Finally, regular and complex nanoparticle arrays were successfully fabricated after tuning the plasmon resonances. This study provides an effective method for fabricating programmable nanoparticle arrays on flexible films. [Display omitted] • Femtosecond laser-induced transfer is employed to print the small-scale and well-defined nanoparticles array with inevitable plasmons. • The effects of laser pulse energy and array geometry on the position and size deviations of printed nanoparticles are revealed. • Excitation, reflection, and superposition of the plasmon resonances in patterned island arrays are demonstrated by numerical simulation and theoretical analysis. • The uniformity and accuracy of nanoparticle arrays are improved significantly by adjusting the polarization direction. [ABSTRACT FROM AUTHOR]