27 results on '"Park, Ki-Yeop"'
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2. The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate
3. High-precision self-tool CD matching with focus-target assist pattern by computational ways
4. Lens heating impact analysis and controls for critical device layers by computational method
5. Analysis of the impact of pupil shape variation by pupil fit modeling
6. The analysis of polarization characteristics on 40nm memory devices
7. Lithography performance and simulation accuracy at different polarization states for sub 40nm node
8. The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance
9. Impact of mask defect in a high MEEF process
10. The analysis of polarization characteristics on 40nm memory devices.
11. Lithography performance and simulation accuracy at different polarization states for sub 40nm node.
12. CD-SEM calibration with TEM to reduce CD measurement error
13. The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance.
14. Integration using inorganic BARC in a via-first dual-damascene process with low-k dielectric.
15. The evaluation of assist feature defect printability for sub-0.13-m technology.
16. The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate
17. Reduction of wafer-scale error between DI and FI in multilevel metallization by adjusting edge detection method.
18. Improvement of resist profile roughness in bilayer resist process.
19. Improvement of resist profile roughness in bilayer resist process
20. Optimization of ARC process in DUV lithography
21. Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology
22. Optimization of ARC process in DUV lithography.
23. Process optimization by reducing I-D bias for 0.25-m logic devices.
24. Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology.
25. Mixed alcohol synthesis from carbon monoxide and dihydrogen over potassium-promoted molybdenum carbide catalysts
26. High-precision self-tool CD matching with focus-target assist pattern by computational ways
27. Lens heating impact analysis and controls for critical device layers by computational method
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