235 results on '"Pargon, E."'
Search Results
2. Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices
3. Influence of the Cl2 etching on the Al2O3/GaN metal–oxide–semiconductor interface
4. Extending thermal stability of short-living soliton states in silicon nitride microring resonators
5. Development of low-damage plasma etching processes for preserving AlGaN/GaN heterostructure integrity in MIS HEMT
6. Optical and electrical diagnostics of industrial plasma reactors: measuring the relevant physical quantities to assist process development
7. Generation of Photon Pairs in Linearly Uncoupled Resonators Employing a Reconfigurable Mach-Zehnder Interferometer
8. A Reconfigurable Source of Entangled Frequency bins
9. High Brightness programmable source of frequency-bin qubits.
10. Cycling process in remote plasma source for selective etching with nanometric control
11. III-V/Ge Heterostructure Plasma Etching and Passivation With a Single Plasma Process for Low-Damage Multijunction Solar Cell Fabrication
12. Comparative Study of Low Damage Plasma Etching Processes on the Integrity of AlGaN Layers Integrated in GaN HEMT During Gate Opening
13. Plasma etching of HfO 2 in metal gate CMOS devices
14. Multijunction Solar Cell Electrical Isolation and Passivation with a Single Plasma Process
15. Influence of the Cl2 etching on the Al2O3/GaN metal–oxide–semiconductor interface.
16. Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wells
17. Vacuum ultra violet absorption spectroscopy of 193 nm photoresists
18. Multijunction Solar Cell Electrical Isolation and Passivation with a Single Plasma Process
19. Characterisation of ultraviolet nanoimprint dedicated resists
20. Suppression of Nonlinear Parasitic Processes in Linearly Uncoupled Silicon Resonators
21. A Method for Increasing Thermal Stability of Short-Living Solitons in Silicon Nitride Microresonators
22. Compact soliton generation based on the butt-coupling between a Si3N4 microresonator and a DFB laser
23. Dual Pump Photon Pair Generation with Suppression of Parasitic Processes in Linearly Uncoupled Silicon Resonators
24. Plasma etching processes for the fabrication of a low-loss SiN micro-resonator and low power threshold of parametric oscillations
25. Development and optimization of the Smart Etch concept for SiN spacer etching with high selectivity over Si and SiO2
26. Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas
27. Etching Mechanisms of Si Containing Materials in Remote Plasma Source using NF3 based Gas Mixture
28. III-V/Ge Heterostructure Etching for Through Cell Via Contact Multijunction Solar Cell
29. Characterization of Plasma Induced Damage, Strain and Sidewall Roughness on InP Patterns and Their Impact on Luminescence
30. Optimization of H2 thermal annealing process for the fabrication of ultra-low loss Sub-Micron Silicon-on-Insulator rib Waveguides
31. Low-Loss Silicon Technology for High-Q Bright Quantum Sources
32. Low-Loss Silicon Technology for High-Q Bright Quantum Sources
33. A Source of Heralded Single Photon Using High Quality Factor Silicon Ring Resonators
34. Polarized cathodoluminescence for strain measurement
35. High-yield ultra-low losses Si3N4 microresonators for energy-efficient nonlinear photonics
36. HBr/O2 plasma treatment followed by a bake for photoresist linewidth roughness smoothing.
37. Optimization of optical performances in sub-micron silicon-on-insulator rib and strip waveguides by thermal annealing under H2
38. Anisotropic and Low Damage III-V/Ge Heterostructures via Etching for Multijunction Photovoltaic Cell Fabrication
39. New trends in Plasma Technologies
40. Dry strip efficiency and blisters formation mechanism during High Dose Implant Stripping
41. Ultra-high selective etching in remote plasmas: application to smart etch processes
42. Etching Mechanisms of SiN and SiO2 in NF3/NH3 downstream plasma
43. An atomic force microscopy-based method for line edge roughness measurement.
44. Nonlinear properties of ultra-low losses hydrogen-annealed submicron silicon waveguides
45. Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy.
46. Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists.
47. Chlorine-based etching of InP laser : effect of plasma chemistry on sidewall roughness and damages
48. Development of plasma etching processes for the integration of III-V semicondutors as trigate nMOSFET’s channels
49. Processes Plasma etching of InP using Cl2/CH4/Ar for hybrid photonic integration on silicon
50. Development of plasma etching processes for the integration of III-V materials on Si for photonic and CMOS applications
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.