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Built-in electric fields appear during the molecular-beam epitaxy of GaSe on a GaAs(001) substrate at the GaSe/GaAs interface, the presence of the fields is evidenced by Franz–Keldysh oscillations observed in photoreflectance spectra. The varying values of the strength of these fields (from 9.8 to 17.6 kV/cm) can be associated both with the diffusion of Se atoms into the GaAs substrate (buffer layer) and with the formation of transient submonolayers during epitaxial growth. Built-in fields are not observed at the interface of structures grown on GaAs(111)B and GaAs(112) substrates, which can be explained by the lower propagation efficiency of Se into the substrate with mentioned orientations when compared with GaAs(001).

The results of studies of the structural and optical properties of two-dimensional GaSe layers grown by molecular-beam epitaxy on GaAs(001) and GaAs(112) substrates using a valve cracking cell for the Se source are reported. The influence of the MBE growth parameters (the substrate temperature, Ga flux intensity, Se/Ga incident flux ratio) on the surface morphology of the layers is studied. By means of transmission electron microscopy, electron diffraction technique, and Raman spectroscopy, it is shown that the structure of the GaSe layers corresponds to the γ-GaSe polytype. From X-ray diffraction analysis, it is established that there exist α-Ga2Se3 inclusions in the GaSe layers grown under conditions of high enrichment of the growth surface with Se.

Development of molecular beam epitaxy (MBE) of two-dimensional (2D) layered materials is an inevitable step in realizing novel devices based on 2D materials and heterostructures. However, due to existence of numerous polytypes and occurrence of additional phases, the synthesis of 2D films remains a difficult task. This paper reports on MBE growth of GaSe, InSe, and GaTe layers and related heterostructures on GaAs(001) substrates by using a Se valve cracking cell and group III metal effusion cells. The sophisticated self-consistent analysis of X-ray diffraction, transmission electron microscopy, and Raman spectroscopy data was used to establish the correlation between growth conditions, formed polytypes and additional phases, surface morphology and crystalline structure of the III&ndash, VI 2D layers. The photoluminescence and Raman spectra of the grown films are discussed in detail to confirm or correct the structural findings. The requirement of a high growth temperature for the fabrication of optically active 2D layers was confirmed for all materials. However, this also facilitated the strong diffusion of group III metals in III&ndash, VI and III&ndash, VI/II&ndash, VI heterostructures. In particular, the strong In diffusion into the underlying ZnSe layers was observed in ZnSe/InSe/ZnSe quantum well structures, and the Ga diffusion into the top InSe layer grown at ~450 &deg, C was confirmed by the Raman data in the InSe/GaSe heterostructures. The results on fabrication of the GaSe/GaTe quantum well structures are presented as well, although the choice of optimum growth temperatures to make them optically active is still a challenge.

This paper reports the results on the microphotoluminescence (µPL) and photoreflectance (PR) spectroscopy studies of InSe thin film grown by molecular beam epitaxy on GaAs(001) substrate. The specific surface morphology of the InSe/GaAs(001) layer consisting of a number of randomly oriented nanoplatelets with the average thickness of 40–200 nm leads to a difference in optical properties measured on the macroscale (PR) and microscale (µPL). The highest energy peak at 1.348 eV observed in the µPL spectra at low excitation densities was attributed to the recombination of localized excitons in ε -InSe.

Quasi-two-dimensional GaTe layers were grown by molecular beam epitaxy on GaAs (001) substrates at Ts = 450–520°C. The effect of the growth temperature on the GaTe surface morphology has been studied by scanning electron microscopy. It is shown that GaTe layer grown at high Ts = 520°C exhibits pronounced surface relief anisotropy. This sample demonstrates also near band-edge photoluminescence (PL) at T = 11K with the peak energy of ∼1.72 eV, which can be associated with the emission of excitons bound at the acceptor. The nature of 1.45 eV and 1.57 eV peaks appearing in the PL spectra is also discussed in detail.

The paper reports on molecular beam epitaxy of ZnSe/InSe/ZnSe quantum well (QW) heterostructures grown on GaAs(001) substrates as well as studies of their structural properties. The structures were characterized by reflection high energy electron diffraction, scanning electron microscopy, and high-resolution transmission electron microscopy techniques. The evolution of surface morphology of QW heterostructures as a function of the InSe thickness has been studied. The quasi van der Waals growth of ZnSe on the InSe(0001) surface has been demonstrated, with the ZnSe(111) plane being oriented parallel to the (0001) plane of InSe because of a small lattice mismatch between InSe and ZnSe(111).

A complete group-theoretical analysis of vibrational modes in ε, β, γ-GaSe polytypes has been performed. Raman spectroscopy data obtained on single crystals of ε-GaSe with a subsequent group-theoretical analysis were used to analyze the Raman spectra low-dimensional GaSe structures. Information was obtained on the structural properties of epitaxial layers and arrays of nanorods of the ε-polytype GaSe grown by molecular beam epitaxy on GaAs (001) substrates.