4 results on '"Ozaita, M."'
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2. Hydrogen and processing damage in CMOS device reliability: defect passivation and depassivation during plasma exposures and subsequent annealing
3. A New Methodology for Monitoring and Comparing Edge Exposure and Plasma Charging Current Damage from Plasma Processing.
4. A New Methodology for Monitoring and Comparing Edge Exposure and Plasma Charging Current Damage from Plasma Processing
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