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1. High-Performance Ferroelectric Field-Effect Transistors with Ultra-High Current and Carrier Densities

2. CMOS-Compatible, AlScN-Based Integrated Electro-Optic Modulator

3. Materials for High Temperature Digital Electronics

4. Multi-State, Ultra-thin, BEOL-Compatible AlScN Ferroelectric Diodes

5. Near 6 GHz Sezawa Mode Surface Acoustic Wave Resonators using AlScN on SiC

6. Non-Volatile Control of Valley Polarized Emission in 2D WSe2-AlScN Heterostructures

7. S-band acoustoelectric amplifier utilizing an ultra-high thermal conductivity heterostructure for low self-heating

8. Scalable and Stable Ferroelectric Non-Volatile Memory at > 500 $^\circ$C

9. Frequency Tunable Magnetostatic Wave Filters With Zero Static Power Magnetic Biasing Circuitry

10. MoS$_{2}$/Al$_{0.68}$Sc$_{0.32}$N negative capacitance field-effect transistors

13. CMOS-compatible, AlScN-based integrated electro-optic phase shifter

14. Reconfigurable Compute-In-Memory on Field-Programmable Ferroelectric Diodes

15. Scalable CMOS-BEOL compatible AlScN/2D Channel FE-FETs

16. Scalable CMOS back-end-of-line-compatible AlScN/two-dimensional channel ferroelectric field-effect transistors

18. Post-CMOS Compatible Aluminum Scandium Nitride/2D Channel Ferroelectric Field-Effect-Transistor

19. Physical Signal Classification Via Deep Neural Networks

20. Sub-quarter micrometer periodically poled Al0.68Sc0.32N for ultra-wideband photonics and acoustic devices.

24. Tailorable Stimulated Brillouin Scattering in Nanoscale Silicon Waveguides

27. Electrical breakdown strength enhancement in aluminum scandium nitride through a compositionally modulated periodic multilayer structure.

28. Tuning Polarity in WSe2/AlScN FeFETs via Contact Engineering

29. Negative capacitance field-effect transistors based on ferroelectric AlScN and 2D MoS2.

30. High Isolation, Double-Clamped, Magnetoelectric Microelectromechanical Resonator Magnetometer.

31. Metal-ferroelectric AlScN-semiconductor memory devices on SiC wafers.

32. Low Noise, Strain Modulated, Multiferroic Magnetic Field Sensor Systems

33. Ferroelectric behavior of sputter deposited Al0.72Sc0.28N approaching 5 nm thickness.

35. Compensation of the Stress Gradient in Physical Vapor Deposited Al 1−x Sc x N Films for Microelectromechanical Systems with Low Out-of-Plane Bending.

36. Vertical and Lateral Etch Survey of Ferroelectric AlN/Al 1−x Sc x N in Aqueous KOH Solutions.

37. Contributors

38. Strongly enhanced second-order optical nonlinearity in CMOS-compatible Al1−xScxN thin films.

40. Al0.68Sc0.32N Lamb wave resonators with electromechanical coupling coefficients near 10.28%.

43. Piezoelectric aluminum nitride thin films for microelectromechanical systems

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