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The method of TiSiCN-coatings deposition by anodic evaporation of Ti and decomposition of an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with a self-heated hollow cathode is investigated. The plasma composition was analyzed by optical emission spectroscopy. TiSiCN coatings with a thickness of up to 10 microns and a hardness of up to 30 GPa were obtained in 1.5 hours at a temperature of 400 C. © Published under licence by IOP Publishing Ltd.

Method for low-temperature (<200°C) deposition of SiCN-based coatings in a large volume chamber (0.3 m 3 ) by decomposition of organosilicon precursor in nitrogen-argon plasma of discharge with self-heated hollow cathode and remote anode (40 cm) at pressure of ∼1 mTorr was investigated. The analysis of the composition of coatings by IR spectroscopy and the analysis of plasma composition are carried out by optical emission spectroscopy. The influence of discharge current (10-40 A) and the flow of gas mixture (5-15 sccm hexamethyldisilazane and 60 sccm Ar-N 2 mixture) on plasma composition and elemental composition of coatings was investigated. It is shown that the degree of decomposition of precursor molecules is increased with growth of the current and with increase of Ar content in the gas mixture. © 2018 Web Portal IOP. All rights reserved.