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3 results on '"O'uchi, Shinich"'

2. A Comparative Study of Nitrogen Gas Flow Ratio Dependence on the Electrical Characteristics of Sputtered Titanium Nitride Gate Bulk Planar Metal–Oxide–Semiconductor Field-Effect Transistors and Fin-Type Metal–Oxide–Semiconductor Field-Effect Transistors

Author

Hayashida, Tetsuro, primary, Liu, Yongxun, additional, Matsukawa, Takashi, additional, Endo, Kazuhiko, additional, O'uchi, Shinich, additional, Sakamoto, Kunihiro, additional, Ishii, Kenichi, additional, Tsukada, Junichi, additional, Ishikawa, Yuki, additional, Yamauchi, Hiromi, additional, Suzuki, Eiichi, additional, Ogura, Atsushi, additional, and Masahara, Meishoku, additional

Published
2009
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3. Nitrogen Gas Flow Ratio and Rapid Thermal Annealing Temperature Dependences of Sputtered Titanium Nitride Gate Work Function and Their Effect on Device Characteristics

Author

Liu, Yongxun, primary, Hayashida, Tetsuro, additional, Matsukawa, Takashi, additional, Endo, Kazuhiko, additional, Masahara, Meishoku, additional, O'uchi, Shinich, additional, Sakamoto, Kunihiro, additional, Ishii, Kenichi, additional, Tsukada, Junichi, additional, Ishikawa, Yuki, additional, Yamauchi, Hiromi, additional, Ogura, Atsushi, additional, and Suzuki, Eiichi, additional

Published
2008
Full Text
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