1. Embedded Micro-detectors for EUV Exposure Control in FinFET CMOS Technology
- Author
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Chien-Ping Wang, Burn Jeng Lin, Pin-Jiun Wu, Jiaw-Ren Shih, Yue-Der Chih, Jonathan Chang, Chrong Jung Lin, and Ya-Chin King
- Subjects
Nano Express ,Extreme ultraviolet (EUV) ,TA401-492 ,General Materials Science ,Detectors ,Condensed Matter Physics ,FinFET CMOS technologies ,Materials of engineering and construction. Mechanics of materials - Abstract
An on-wafer micro-detector for in situ EUV (wavelength of 13.5 nm) detection featuring FinFET CMOS compatibility, 1 T pixel and battery-less sensing is demonstrated. Moreover, the detection results can be written in the in-pixel storage node for days, enabling off-line and non-destructive reading. The high spatial resolution micro-detectors can be used to extract the actual parameters of the incident EUV on wafers, including light intensity, exposure time and energy, key to optimization of lithographic processes in 5 nm FinFET technology and beyond.
- Published
- 2022