1. Advanced processes in metal-oxide resists for high-NA EUV lithography
- Author
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Dinh, Cong Que, primary, Nagahara, Seiji, additional, Cho, Kayoko, additional, Tomori, Hikari, additional, Kuwahara, Yuhei, additional, Onitsuka, Tomoya, additional, Okada, Soichiro, additional, Kawakami, Shinichiro, additional, Hara, Arisa, additional, Fujimoto, Seiji, additional, Muramatsu, Makoto, additional, Tsuzuki, Reiko, additional, Liu, Xiang, additional, Thiam, Arame, additional, Feurprier, Yannick, additional, Nafus, Kathleen, additional, Carcasi, Michael A., additional, Huli, Lior, additional, Kato, Kanzo, additional, Krawicz, Alexandra, additional, Kocsis, Michael, additional, De Schepper, Peter, additional, McQuade, Lauren, additional, Kasahara, Kazuki, additional, Garcia Santaclara, Jara G., additional, Hoefnagels, Rik, additional, La Fontaine, Bruno, additional, Miyakawa, Ryan H., additional, Anderson, Chris N., additional, and Naulleau, Patrick P., additional
- Published
- 2024
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