90 results on '"Moriya, Tsuyoshi"'
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2. Vacancy-type defects in TiN/ZrO2/TiN capacitors probed by monoenergetic positron beams
3. Impact of ion energies in Ar/H2 capacitively coupled radio frequency discharges on PEALD processes of titanium films
4. Optimization of uniformity in plasma ashing process using genetic programming
5. Systematic Search for Stabilizing Dopants in ZrO₂ and HfO₂ Using First-Principles Calculations.
6. Systematic Search for Stabilizing Dopants in ZrO2 and HfO2 Using First-Principles Calculations
7. Impact of Cation Vacancies on Leakage Current on TiN/ZrO2/TiN Capacitors Studied by Positron Annihilation
8. Guest Editorial Special Section on the 2020 International Symposium on Semiconductor Manufacturing
9. Machine Learning Approaches Optimizing Semiconductor Manufacturing Processes
10. Education of Corporate Engineers Including Employment of People with Disabilities
11. Particle reduction and control in plasma etching equipment
12. Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
13. Guest Editorial Special Section on the 2018 International Symposium on Semiconductor Manufacturing
14. Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors
15. 共存・共生のマネジメント
16. Machine Learning Approaches for Process Optimization
17. Guest Editorial Special section on the 2022 International Symposium on Semiconductor Manufacturing.
18. Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes.
19. Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
20. Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
21. Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering
22. Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
23. Using an Optical Motion Sensor for Visualization and Analysis of Maintenance Work on Semiconductor Manufacturing Equipment
24. Visualization technique of maintenance work with a motion capture sensor
25. Observation and Elimination of Recoil Particles From Turbo Molecular Pumps
26. Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering
27. Vacancy-Type Defects Introduced by Gas Cluster Ion-Implantation on Si Studied by Monoenergetic Positron Beams
28. Engineering Ethics Education Based Enlighten Theory of Group Education Activity
29. Technology to Watch and Control Particles in Vacuum Processing Equipment
30. Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall
31. In Situ Particle Monitors: The Next Level of Yield Control for Critical Processes
32. Nano-thickness Stellar Defects
33. 1P1-B21 A method for optimal cooperative control of redundant muscles
34. 20919 Control of robot manipulator using Strand-muscle actuators
35. Observation of Heat-Induced Particle Resuspension and Transport in a Plasma Chemical Vapor Deposition Chamber
36. 1P2-S-004 Development of robot manipulator using Strand-muscle actuators(Flexible Mechanism,Mega-Integration in Robotics and Mechatronics to Assist Our Daily Lives)
37. Capture of flaked particles during plasma etching by a negatively biased electrode
38. Knowledge sharing and creation in the semiconductor equipment industry.
39. The application ofin situmonitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition
40. Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process
41. Observation of the trajectories of particles in process equipment by an in situ monitoring system using a laser light scattering method
42. Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamber in relation to its status with the equipment
43. A Study of Native Defects in Ag-doped HgCdTe by Positron Annihilation
44. Annealing Properties of Defects in B+- and F+-Implanted Si Studied Using Monoenergetic Positron Beams
45. Fluorine-Related Defects in BF2 +-Implanted Si Probed by Monoenergetic Positron Beams
46. Studies on the Formation of the Crown Root Primordia of Rice Plant III. Cultivar differences of the formation of the crown root primordia in the unelongated stem.
47. Defects in Ion-Implanted 3C–SiC Probed by a Monoenergetic Positron Beam
48. Positron Annihilation in Germanium in Thermal Equilibrium at High Temperature
49. Effects of Recoil-Implanted Oxygen on Depth Profiles of Defects and Annealing Processes in P+-Implanted Si Studied Using Monoenergetic Positron Beams
50. Formation of Oxygen-Related Defects Enhanced by Fluorine in BF2 +-Implanted Si Studied by a Monoenergetic Positron Beam
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