226 results on '"Minea T"'
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2. On the electron energy distribution function in the high power impulse magnetron sputtering discharge
3. R&D around a photoneutralizer-based NBI system (Siphore) in view of a DEMO Tokamak steady state fusion reactor
4. Grazing incidence fast atom diffraction in high-pressure conditions
5. On the polytropic coefficient of negative ions for modeling the sheath and presheath of electronegative plasmas.
6. Quantifying methane vibrational and rotational temperature with Raman scattering
7. Particle injection methods in 3D-PIC MCC simulations applied to plasma grid biasing.
8. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
9. H- beam formation simulation in negative ion source for CERN's Linac4 accelerator
10. Role of Electron–Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy
11. The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water
12. Effect of space charge on vacuum pre-breakdown voltage and electron emission current.
13. Target ion and neutral spread in high power impulse magnetron sputtering
14. Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition
15. Plasma power balance: methodology and investigations of microwave capillary discharges
16. Self-consistent Monte Carlo model for ECRIS plasma simulation
17. Beam Formation Studies on the CERN IS03b H Source
18. Simulation of Beam Formation in the CERN Negative Ion Source for the Linac4 Accelerator
19. On the use of ultra-high resolution PIC methods to unveil microscale effects of plasma kinetic instabilities: electron trapping and release by electrostatic tidal effect
20. Beam Formation Studies on the CERN IS03b H$^-$ Source
21. Target ion and neutral spread in high power impulse magnetron sputtering.
22. Modeling of the lithium based neutralizer for ITER neutral beam injector
23. On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge
24. Effect of tantalum nitride supporting layer on growth and morphology of carbon nanotubes by thermal chemical vapor deposition
25. The European contribution to the development of the ITER NB injector
26. Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth
27. Modeling of high power impulse magnetron sputtering discharges with graphite target
28. Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge
29. Tantalum based coated substrates for controlling the diameter of carbon nanotubes
30. Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD
31. A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region model.
32. Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge.
33. Template synthesis of carbon nanotubes from porous alumina matrix on silicon
34. Low temperature plasma carbon nanotubes growth on patterned catalyst
35. Relative contributions to the emission within bundles of carbon nanocone emitters
36. Non-oxidative coupling of methane in microwave plasmas
37. Power balance and heat control in capillary microwave argon plasmas
38. Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films
39. Role of Electron–Ion Dissociative Recombination in $$\hbox {CH}_{4}$$ Microwave Plasma on Basis of Simulations and Measurements of Electron Energy
40. Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process
41. Magnetron-sputtered Ta$_3$N$_5$ thin films for water photoelectrolysis
42. On Recycling in High Power Impulse Magnetron Sputtering Discharges
43. Preferential vibrational excitation in microwave nitrogen plasma assessed by Raman scattering
44. Linac4 H− source R&D: Cusp free ICP and magnetron discharge
45. Extracted current saturation in negative ion sources.
46. Linac4 H- Source R&D: Cusp Free ICP and Magnetron Discharge.
47. Time resolved metal line profile by near-ultraviolet tunable diode laser absorption spectroscopy.
48. A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons
49. Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition.
50. Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS
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