1. Analysis of Vertical GaN JBS and p-n Diodes by Mg Ion Implantation and Ultrahigh-Pressure Annealing
- Author
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Stein, Shane R., Khachariya, Dolar, Mecouch, Will, Mita, Seiji, Reddy, Pramod, Tweedie, James, Sierakowski, Kacper, Kamler, Grzegorz, Bockowski, Michal, Kohn, Erhard, Sitar, Zlatko, Collazo, Ramon, and Pavlidis, Spyridon
- Abstract
We report on vertical GaN junction barrier Schottky (JBS) diodes formed by Mg ion implantation and ultrahigh -pressure annealing (UHPA). The static ON-state characteristics of the diodes show an ideality factor of 1.05, a turn-on voltage of ~0.7 V, a current rectification ratio of
$\sim 10^{11}$ - Published
- 2024
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