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Sc0.18Al0.82N/GaN with state-of-the-art x-ray diffraction figures of merit grown by metal modulated epitaxy under metal-rich conditions and a low substrate temperature of 400 °C is demonstrated to have improved crystalline order [250 arc sec for the (0002) reflection and 469 arc sec for the (10 1 ¯ 5)] compared to a previous state-of-the-art sample grown at a more conventional temperature of 650 °C. While both samples show a columnar structure, the higher substrate temperature sample has a good symmetric rocking curve (RC) of 229 arc sec, but unlike the lower temperature sample, the RC of the (10 1 ¯ 5) asymmetric reflection could not be measured, indicating a more columnar structure common among ScAlN films. Local lattice constant maps (LLCMs) from 4D-STEM depict abrupt strain relaxation within ∼2 nm from the ScAlN/GaN interface for the sample grown at Tsub = 400 °C. Since these LLCMs suggest a lattice mismatch in the a-lattice constant, and since the films show a sudden roughening, the composition for lattice match to GaN may be less than the accepted 18%–20% Sc, consistent with the average GaN lattice match from lattice constant values reported in the literature of 12%. Compared to traditional III-Nitrides, ScAlN films have substantially more screw and mixed-type threading dislocations, suggesting substantial shear forces that result in significant twist and distortion leading to orthorhombic diffraction patterns as viewed from plan-view TEM in the Tsub = 650 °C sample. These results offer the possibility of ScAlN integration into low-thermal-budget processes including CMOS but further indicate that structural understanding of ScAlN remains lacking. [ABSTRACT FROM AUTHOR]

The discovery of analog LixNbO2 memristors revealed a promising new memristive mechanism wherein the diffusion of Li+ rather than O2- ions enables precise control of the resistive states. However, directly correlating lithium concentration with changes to the electronic structure in active layers remains a challenge and is required to truly understand the underlying physics. Chemically delithiated single crystals of LiNbO2 present a model system for correlating lithium variation with spectroscopic signatures from operando soft x-ray spectroscopy studies of device active layers. Using electronic structure modeling of the x-ray spectroscopy of LixNbO2 single crystals, we demonstrate that the intrinsic memristive behavior in LixNbO2 active layers results from field-induced degenerate p-type doping. We show that electrical operation of LixNbO2-based memristors is viable even at marginal Li deficiency and that the analog memristive switching occurs well before the system is fully metallic. This study serves as a benchmark for material synthesis and characterization of future LixNbO2-based memristor devices and suggests that valence change switching is a scalable alternative that circumvents the electroforming typically required for filamentary-based memristors.

Memristors are a promising technology to surpass the limitations of the current silicon complementary metal-oxide-semiconductor architecture via the realization of neuromorphic computing. Here, we demonstrate intercalation-based non-volatile lithium niobite (Li1 – xNbO2) memristors for highly scalable, efficient, and dense neuromorphic circuitry. Volatile, semi-volatile, and non-volatile operation is achieved using a single material, where each operational mode provides a timescale that enables short-term, medium-term, and long-term memory in conjunction with computation-in-memory. The two-terminal non-volatile devices exhibit conductance changes of up to ∼2000% and have inherent non-binary operations proportional to flux linkage, allowing for analog neuromorphic functions mimicking synaptic weight updates. It is shown that Li1 – xNbO2 devices are highly scalable due to the intercalation-based mechanism, with non-volatile operation requiring a mere 150 mV for a 4 μm2 device, the lowest reported operating voltage for an inorganic non-volatile memristor. The programming voltage scales linearly with device size, projecting millivolt operation and attojoule energy consumption for nanoscale devices. [ABSTRACT FROM AUTHOR]

The structural quality of indium-rich Al0.3In0.7N grown by metal modulated epitaxy (MME), previously demonstrating x-ray diffraction (XRD) figures of merit ∼11 times better than the previous literature is investigated to explain the origin of such a large quality improvement. Four-dimensional scanning transmission electron microscope was used to map the lattice parameter near the AlInN/GaN heterojunction and indicate a 5.4% lattice constant change, suggesting 75% relaxation within ∼2 nm from the interface. Cross-sectional TEM Moiré fringes are observed at the AlInN/GaN heterointerface, indicating that there are misfit dislocations between AlInN and GaN which, while rare, have been observed for other highly mismatched In-rich III-Nitrides. The TEM measurements show regions of contrast indicating larger scale variations in strain, but defect contrast associated with dislocations and/or intrinsic basal stacking faults was minimal, indicating a good quality AlInN film and confirming prior XRD results. Significant electron beam induced damage can occur and depended strongly on operational conditions. The damage threshold current density was estimated using time-dependent TEM to be ∼5.7 A/cm2, significantly lower than from prior studies of InGaN. Damage also strongly depends on the thickness of the TEM foil examined and occurred at thicknesses greater than found for InGaN. The present study suggests that the MME technique is an excellent candidate for growing high-quality indium-rich AlInN films as compared to the traditional molecular beam epitaxy or metal organic chemical vapor deposition techniques. [ABSTRACT FROM AUTHOR]

The discovery of analog LixNbO2 memristors revealed a promising new memristive mechanism wherein the diffusion of Li+ rather than O2− ions enables precise control of the resistive states. However, directly correlating lithium concentration with changes to the electronic structure in active layers remains a challenge and is required to truly understand the underlying physics. Chemically delithiated single crystals of LiNbO2 present a model system for correlating lithium variation with spectroscopic signatures from operando soft x-ray spectroscopy studies of device active layers. Using electronic structure modeling of the x-ray spectroscopy of LixNbO2 single crystals, we demonstrate that the intrinsic memristive behavior in LixNbO2 active layers results from field-induced degenerate p-type doping. We show that electrical operation of LixNbO2-based memristors is viable even at marginal Li deficiency and that the analog memristive switching occurs well before the system is fully metallic. This study serves as a benchmark for material synthesis and characterization of future LixNbO2-based memristor devices and suggests that valence change switching is a scalable alternative that circumvents the electroforming typically required for filamentary-based memristors. [ABSTRACT FROM AUTHOR]