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Cu2ZnSnS4 (CZTS) thin films were deposited on glass-slide substrates by ultrasonic spray pyrolysis at the substrate temperatures in the 330–420 °C range, using water–ethanol solutions containing CuCl2–H2O, ZnCl2, SnCl2, and (NH2)2CS (thiourea). After being deposited, CZTS films were annealed under vacuum and then characterized in regarding their structural and optical properties. The X-ray diffraction and Raman spectroscopy studies indicated that CZTS thin films with kesterite as predominant phase could be obtained. The X-ray diffraction patterns of all deposited samples displayed diffraction peaks corresponding to the planes (112), (220), and (312) of kesterite CZTS and diffraction peaks belonging to phases other than CZTS were apparently undetectable for the X-ray technique. Furthermore, their Raman spectra were featured for a widely structured Raman band in the 200–400 cm−1 wavenumber area. After being deconvoluted, Raman peaks belonging only to kesterite CZTS were revealed. However, a further analysis of the UV–Vis absorbance spectra indicated all our films strongly absorbs in this spectral region. In the low photon energy region (

This work presents the advances in the synthesis and characterization of magnetite-graphene oxide nanocomposite synthetized by coprecipitation. Structural and physicochemical properties were analyzed by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), transmission electron microscopy (TEM) and vibrating sample magnetometer (VSM). XRD and FT-IR analyses corroborated that magnetite was obtained. Nanoparticle mean size from XRD analysis revealed that it decreased when graphene oxide (GO) was present. TEM displayed that magnetite decorates the GO and VSM revealed superparamagnetic behavior.

This work reports the synthesis and characterization of few layers graphene (FLG) film, which was grown by using a home-made APCVD set-up. The FLG films were grown on evaporated polycrystalline nickel films under a mixture of argon and methane with a relatively large-flow and for very short deposition times. The experimental parameters such as the argon/methane ratio and temperature were varied from 800 to 1000 °C, to obtain the optimal FLG deposition parameters. We were able to obtain relatively large area (1 × 1 inch) FLG films comprising 3-5 graphene sheets. Additionally, early attempts to make suitable graphene/SiO2/Si electronic devices are also reported.