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Beyond-Moore computing technologies are expected to provide a sustainable alternative to the von Neumann approach not only due to their down-scaling potential but also via exploiting device-level functional complexity at the lowest possible energy consumption. The dynamics of the Mott transition in correlated electron oxides, such as vanadium dioxide, has been identified as a rich and reliable source of such functional complexity. However, its full potential in high-speed and low-power operation has been largely unexplored. We fabricated nanoscale VO$_{2}$ devices embedded in a broad-band test circuit to study the speed and energy limitations of their resistive switching operation. Our picosecond time-resolution, real-time resistive switching experiments and numerical simulations demonstrate that tunable low-resistance states can be set by the application of 20~ps long, $<$1.7~V amplitude voltage pulses at 15~ps incubation times and switching energies starting from a few femtojoule. Moreover, we demonstrate that at nanometer-scale device sizes not only the electric field induced insulator-to-metal transition, but also the thermal conduction limited metal-to-insulator transition can take place at timescales of 100's of picoseconds. These orders of magnitude breakthroughs open the route to the design of high-speed and low-power dynamical circuits for a plethora of neuromorphic computing applications from pattern recognition to numerical optimization.

The giant magnetoresistance (GMR) and structure was investigated for electrodeposited Co/Cu multilayers prepared by a conventional galvanostatic/potentiostatic pulse combination from a pure sulfate electrolyte with various layer thicknesses, total multilayer thickness and Cu deposition potential. X-ray diffraction (XRD) measurements revealed superlattice satellite reflections for many of the multilayers having sufficiently large thickness (at least 2 nm) of both constituent layers. The bilayer repeats derived from the positions of the visible superlattice reflections were typically 10-20% higher than the nominal values.The observed GMR was found to be dominated by the multilayer-like ferromagnetic (FM) contribution even for multilayers without visible superlattice satellites. There was always also a modest superparamagnetic (SPM) contribution to the GMR and this term was the largest for multilayers with very thin (0.5 nm) magnetic layers containg apparently a small amount of magnetically decoupled SPM regions. No oscillatory GMR behavior with spacer thickness was observed at any magnetic layer thickness. The saturation of the coercivity as measured by the peak position of the MR(H) curves indicated a complete decoupling of magnetic layers for large spacer thicknesses. The GMR increased with total multilayer thickness which could be ascribed to an increasing SPM contribution to the GMR due to an increasing surface roughness, also indicated by the increasing coercivity. For multilayers with Cu layers deposited at more and more positive potentials, the GMRFM term increased and the GMRSPM term decreased. At the same time, a corresponding reduction of surface roughness measured with atomic force microscopy indicated an improvement of the multilayer structural quality which was, however, not accompanied by an increase of the superlattice reflection intensities., Comment: 29 pages, 10 figures

It has been shown previously for electrodeposited Co/Cu multilayers that the single-bath electrodeposition process can be optimized from an electrochemical point of view in order to avoid unwanted Co dissolution and incorporation of Co in the non-magnetic layer during the Cu deposition pulse. In the present work, electrodeposition of Ni-Co/Cu multilayers has been studied to clarify if the same optimization method is appropriate when two magnetic elements are present and if this potential results in the largest giant magnetoresistance (GMR) for the particular alloy system studied. For this purpose, several Ni-Co/Cu multilayers were prepared by varying the deposition potential of the Cu layer. The composition analysis of the deposits showed that the Ni:Co ratio exhibits a minimum as a function of the Cu deposition potential, which can be explained by considering both the dissolution of Co and the mass transport of the reactants. Both the saturation GMR value and the intensity of the satellite peaks in the X-ray diffractograms were highly correlated with the resulting surface roughness of the deposits which was strongly varying with the Cu deposition potential. Higher GMR values, lower saturation fields and more perfect multilayer structure were observed for sufficiently positive Cu deposition potentials only which enabled a partial Co dissolution resulting in a reduced surface roughness. The results draw attention to the complexity of the optimization procedure of the deposition of multilayers with several alloying components., Comment: 26 pages, 10 figures