1. RF-CMOS performance trends
- Author
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M.J. Knitel, L.F. Tiemeijer, R. van Langevelde, A.J. Scholten, D.B.M. Klaassen, A.T.A. Zegers-van Duijnhoven, and Pierre H. Woerlee
- Subjects
Power gain ,Engineering ,business.industry ,Electrical engineering ,Linearity ,Hardware_PERFORMANCEANDRELIABILITY ,Integrated circuit design ,Noise figure ,Noise (electronics) ,Cutoff frequency ,Electronic, Optical and Magnetic Materials ,CMOS ,Hardware_INTEGRATEDCIRCUITS ,Electronic engineering ,Electrical and Electronic Engineering ,business ,NMOS logic ,Hardware_LOGICDESIGN - Abstract
The impact of scaling on the analog performance of MOS devices at RF frequencies was studied. Trends in the RF performance of nominal gate length NMOS devices from 350-nm to 50-nm CMOS technologies are presented. Both experimental data and circuit simulations with an advanced validated compact model (MOS Model 11) have been used to evaluate the RF performance. RF performance metrics such as the cutoff frequency, maximum oscillation frequency, power gain, noise figure, linearity, and 1/f noise were included in the analysis. The focus of the study was on gate and drain bias conditions relevant for RF circuit design. A scaling methodology for RF-CMOS based on limited linearity degradation is proposed.
- Published
- 2001
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