1. Preparation of high aspect ratio surface microstructures out of a Zr-based bulk metallic glass
- Author
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M. Cucinelli, Andreas A. Kündig, Peter J. Uggowitzer, and Alex Dommann
- Subjects
Amorphous metal ,Materials science ,Metallurgy ,Molding (process) ,Condensed Matter Physics ,Microstructure ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,law ,Deep reactive-ion etching ,Wafer ,Wetting ,Electrical and Electronic Engineering ,Reactive-ion etching ,Crystallization ,Composite material - Abstract
Silicon wafers with high aspect ratio surface microstructures, prepared by deep reactive ion etching and coated with a protective layer, are replicated into a Zr-based bulk metallic glass. Therefore, a new process route called hot mold quenching is developed. In this process, the bulk glass-forming alloy and the mold are heated to a temperature of 1350 K to allow complete wetting of the microstructured silicon mold by the melt. After a few seconds, the surface microstructures of high aspect ratio are filled by the melt completely. Mold and melt are then quenched together at a rate of 20 K/s to prevent crystallization in the Zr-Cu-Ni-Al-Ti melt. Subsequently, the wafer is removed by wet etching. Structures of 20 µm height, 8 µm width and a spacing of 1 µm have successfully been replicated into the metallic glass. Tools out of this material have a high strength, a high elastic limit and a good corrosion resistance, and meet the requirements for injection molding of polymers ideally.
- Published
- 2003
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