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Plasma-enhanced atomic layer deposition (PEALD) enables the epitaxial growth of ultrathin indium nitride (InN) films at significantly reduced process temperatures and with greater control of layer thickness compared to other growth methods. However, the reliance on plasma-surface interactions increases the complexity of the growth process. A detailed understanding of the relationship between the plasma properties and the growth kinetics is therefore required to guide the tuning of growth parameters. We present an in situ investigation of the early-stage PEALD growth kinetics of epitaxial InN within three different plasma regimes using grazing incidence small-angle x-ray scattering (GISAXS). The GISAXS data are supported by diagnostic studies of the plasma species generation in the inductively coupled plasma source as a function of the relative concentrations of the nitrogen/argon gas mixture used in the growth process. The growth mode is found to be correlated to the production of nitrogen species in the plasma, with high concentrations of the atomic N species promoting Volmer–Weber growth (i.e., island growth) and low concentrations promoting Stranski–Krastanov growth (i.e., layer-plus-island growth). The critical thickness for island formation, island center-to-center distance, and island radius are found to increase with ion flux. Furthermore, the island center-to-center distance and areal density are observed to change only during plasma exposure and to continue changing with exposure even after the methylindium adlayer is believed to have fully reacted with the plasma. Our results demonstrate the potential to control the growth kinetics during PEALD of epitaxial films by intentionally accessing specific regimes of plasma species generation. [ABSTRACT FROM AUTHOR]

We present a detailed structural investigation of self-assembled indium gallium nitride nanodots grown on c-plane aluminum nitride templates by the droplet heteroepitaxy technique in a plasma assisted molecular beam epitaxy reactor. Various growth parameters, including the total coverage of the metal species, relative and total metal effusion fluxes, and nitridation temperature were investigated. Analyses of in situ reflection high-energy electron diffraction patterns and comparison with simulations showed that the resulting crystal structure was a mixture of wurtzite and twinned zinc blende phases, with the zinc blende phase increasingly dominant for lower metal coverages and lower nitridation temperatures, and the wurtzite phase increasingly dominant for higher nitridation temperature. Studies by field emission scanning electron microscopy and atomic force microscopy revealed that the nanodots exhibit trimodal size distributions, with the dot morphologies of the intermediate size mode often resembling aggregations of distinct clusters. Nanodots grown at higher nitridation temperatures had larger inter-dot spacings, with hexagonal in-plane ordering observable at a sufficiently high temperature. Using grazing incidence small angle X-ray scattering, we determined the nanodots to be approximately truncated cone shaped, and extracted the mean radius, height, and inter-dot distance for each distribution. Microstructural investigations of the nanodots by cross-sectional transmission electron microscopy indicated that the majority of the dots were formed in dislocation-free regions, and confirmed that the intermediate size dots were approximately truncated cone shaped and consisted of both zinc blende and wurtzite regions. Mapping of the elemental distributions by energy dispersive X-ray spectroscopy in scanning transmission electron microscopy mode indicated highly nonuniform indium distributions within both small and intermediate size dots which are potentially indicative of indium clustering and kinetically controlled nanoscale phase separation rather than the spinodal decomposition associated with bulk diffusion. The observed enrichment in indium concentration towards the tops of the nanodot layers could be ascribed to the compositional pulling effect. [ABSTRACT FROM AUTHOR]

Historian, professor and author Edward Bradford Burns died on Dec. 19, 1995 of liver cancer. He will be remembered for his enthusiasm in everything he did, be it teaching, pursuing research, participating in professional organizations, conversing with students or looking for rare books. He was a prolific writer, writing over 150 books, articles, opinion pieces, chapters, prefaces and reviews during his lifetime. In addition, he has written hundreds of oral presentations which he delivered extremely well.

The texture of CoSi2 films on Si(001) substrates has been examined using synchrotron based high-resolution pole figure analysis. We find that axiotaxy, a recently recognized type of texture which was observed in NiSi thin films on Si(001), is also occurring in CoSi2 layers. Typical of axiotaxy texturing, the CoSi2 pole figures show symmetrical patterns of lines. Calculations show that these features on the pole figures are created by three off-normal fiberlike texture components. These off-normal fiber orientations are a consequence of the alignment of CoSi2<110> planes with Si<110> planes because of very similar d spacings, which causes a periodic arrangement along Si<100> directions in the plane of the interface. This one-dimensional periodicity may provide a lower interfacial energy; however, the periodic arrangement along the Si<100> directions may also be indicative of growth anisotropy. The influence of Ti alloying has been investigated by using in situ x-ray diffraction measurements, as well as pole figure analysis. These results show that the nucleation of both the CoSi and CoSi2 phases is delayed to higher temperatures for the 5 at. % Ti alloyed films. The texture of the CoSi2 phase is also influenced by the addition of Ti. © 2004 American Institute of Physics. [ABSTRACT FROM AUTHOR]

Presents information on a study conducted which examined the phase division and long-range atomic ordering in InGaN alloys grown by molecular beam epitaxy. Behavior of films grown at low substrate temperatures; Causes of the difficulties in InGaN growth; Observation of the nucleation and growth of the InGaN films in situ by reflection high energy electron diffraction; Methodology used in the study; Results of the study.

Wide bandgap semiconducting nitrides have found wide-spread application as light emitting and laser diodes and are under investigation for further application in optoelectronics, photovoltaics, and efficient power switching technologies. Alloys of the binary semiconductors allow adjustments of the band gap, an important semiconductor material characteristic, which is 6.2 eV for aluminum nitride (AlN), 3.4 eV for gallium nitride, and 0.7 eV for (InN). Currently, the highest quality III-nitride films are deposited by metalorganic chemical vapor deposition and molecular beam epitaxy. Temperatures of 900 °C and higher are required to deposit high quality AlN. Research into depositing III-nitrides with atomic layer epitaxy (ALEp) is ongoing because it is a fabrication friendly technique allowing lower growth temperatures. Because it is a relatively new technique, there is insufficient understanding of the ALEp growth mechanism which will be essential to development of the process. Here, grazing incidence small angle x-ray scattering is employed to observe the evolving behavior of the surface morphology during growth of AlN by ALEp at temperatures from 360 to 480 °C. Increased temperatures of AlN resulted in lower impurities and relatively fewer features with short range correlations. [ABSTRACT FROM AUTHOR]

The authors have investigated the early stages of indium island formation and growth by vapor phase deposition on room temperature sapphire using real-time grazing incidence small angle x-ray scattering (GISAXS), followed by ex-situ atomic force microscopy and scanning electron microscopy. The results are consistent with the formation and coalescence of hemispherical islands, as described by Family and Meakin. Monte Carlo simulations of systems of coalescing islands were used to supplement and quantify the results of GISAXS, and a good agreement is seen between the data and the simulations. [ABSTRACT FROM AUTHOR]

Effects of seed atoms on the formation of nanodots on silicon surfaces during normal incidence Ar+ ion bombardment at room temperature are studied with real-time grazing-incidence small-angle x-ray scattering (GISAXS), real-time wafer curvature stress measurements and ex situ atomic force microscopy. Although Si surfaces remain smooth during bombardment at room temperature, when a small amount of Mo atoms is supplied to the surface during ion bombardment, the development of correlated structures (“dots”) is observed. Stress measurements show that initially a compressive stress develops during bombardment, likely due to amorphization of the surface and insertion of argon. However, seeding causes a larger tensile stress to develop with further bombardment, possibly due to the formation of higher density regions around the Mo seed atoms on the surface. Detailed fits of the GISAXS evolution during nanostructure growth show that the instability is larger than predicted by the Bradley-Harper theory of curvature-dependent sputter yield. These results suggest that the tensile stress is playing a dominant role in driving the nanodot formation. [ABSTRACT FROM AUTHOR]

Atomic ordering in AlGaN films produced by plasma assisted molecular beam epitaxy (PA-MBE) was investigated with X-ray diffraction (XRD) and transmission electron microscopy selected area diffraction (TEM-SAD). Under nitrogen-rich growth conditions, films undergo 1×1 monolayer cation ordering along the [0001] growth direction. This type of ordering is stronger in N-polar films than in Ga-polar films and is sensitive to the growth ratio of group-III to group-V flux. These observations are in qualitative agreement with the first principal calculations by Northrup and co-workers. Under group-III rich growth conditions of Ga-polar films, the XRD data is consistent with the quasi-random stacking of spontaneously formed 14-ML and 12-ML superlattice structures. Reciprocal space mapping shows a small tilt (0.25°) between the crystallographic c-axis of the wurtzite structure and the superlattice axis. This result can be explained by the presence of c-axis oriented superlattice domains with a parallel step translation between neighboring domains. This result is in qualitative agreement with a recently proposed model by Venezuela and co-workers of self-organized superlattice formation during step flow growth of strained alloys on vicinal surfaces. [Copyright &y& Elsevier]

Investigating the relationship between structure and dynamical processes is a central goal in condensed matter physics. Perhaps the most noted relationship between the two is the phenomenon of de Gennes narrowing, in which relaxation times in liquids are proportional to the scattering structure factor. Here, a similar relationship is discovered during the self-organized ion-beam nanopatterning of silicon using coherent x-ray scattering. However, in contrast to the exponential relaxation of fluctuations in classic de Gennes narrowing, the dynamic surface exhibits a wide range of behaviors as a function of the length scale, with a compressed exponential relaxation at lengths corresponding to the dominant structural motif--self-organized nanoscale ripples. These behaviors are reproduced in simulations of a nonlinear model describing the surface evolution. We suggest that the compressed exponential behavior observed here is due to the morphological persistence of the self-organized surface ripple patterns which form and evolve during ion-beam nanopatterning. [ABSTRACT FROM AUTHOR]

Examines the atomic long range ordering in Al[sub x]Ga[sub 1-x]N thin films grown by electron cyclotron resonance assisted molecular beam epitaxy. Growth of films on sapphire and 6H-silicon carbide; Dependence of the ordering degree on the flux ratio; Adjustment of film composition through the beam equivalent pressure.

Examines the growth of YBa[sub 2]Cu[sub 3]O[sub 7-delta] films on LaAlO[sub 3] by pulsed-laser deposition. Coexistence of grains in thin films; Proportion of axial grains from film to film; Determination of electrical quality films by small rotation of in-plane epitaxy.