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176 results on '"Luches, Armando"'

8. Deposition of chromium oxide thin films with large thermoelectromotive force coefficient by reactive pulsed laser ablation

Author

CARICATO, Anna Paola, LUCHES, Armando, MARTINO, Maurizio, D. Valerini, YV Kudryavtsev, AM Korduban, SA Mulenko, NT Gorbachuk, Caricato, Anna Paola, Luches, Armando, Martino, Maurizio, D., Valerini, Yv, Kudryavtsev, Am, Korduban, Sa, Mulenko, and Nt, Gorbachuk

Subjects
Chromium oxides, Reactive pulsed laser deposition, Nanometric films, Thermo-sensors
Abstract

Thin films of chromium oxides were deposited on Si substrates by KrF laser ablation of a chromium target in O(2) atmosphere (0.05-5.0 Pa). Films exhibit semiconducting properties with band gap increasing (0.32-0.71 eV) with increasing pressure from 0.05 to 1.0 Pa. The largest values of the thermoelectromotive force coefficient S (similar to 3.5-4.5 mV/K) were measured in the temperature range 270-290 K for the film deposited at 1.0 Pa. The S coefficient decreases in the same temperature range for the film deposited at lower oxygen pressures.

Published
2010

10. Deposition of films and layers for sensors with PLD and LIFT method

Author

S. A. MULENKO, Y. V. KUDRYAVTSEV, N. T. GORBACHUK, LUCHES, Armando, CARICATO, Anna Paola, V. P. VEIKO, V. A. CHUIKO, A. A. PETROV, Vadim Veiko, S. A., Mulenko, Y. V., Kudryavtsev, N. T., Gorbachuk, Luches, Armando, Caricato, Anna Paola, V. P., Veiko, V. A., Chuiko, and A. A., Petrov

Published
2008

11. Deposition of thin films of metal silicides by PLD and LIFT

Author

S. A. Mulenko, Y. V. Kudryavtsev, N. T. Gorbachuk, V. P. Veiko, A. A. Petrov, V. A. Chuiko, CARICATO, Anna Paola, LUCHES, Armando, S. A., Mulenko, Y. V., Kudryavtsev, N. T., Gorbachuk, Caricato, Anna Paola, Luches, Armando, V. P., Veiko, A. A., Petrov, and V. A., Chuiko

Subjects
Laser ablation, silicides
Published
2008

19. Laser-assisted Deposition of Boron Nitride Thin Films and Nanotubes

Author

Luches, Armando, Caricato, Anna Paola, Luches, Armando, and Caricato, Anna Paola

Subjects
Laser beams--Industrial applications, Nanotubes--Materials, Boron nitride, Thin films--Materials
Abstract

Pulsed laser deposition (PLD) is at present one of the most interesting technique for thin film deposition. In the PLD process a film is formed by ablating a solid target with energetic laser pulses and collecting the material of interest on a substrate placed a few cm from the target. According to its ability to carry the stoichiometry from the target to the substrate and to its relatively high growth rate (~0.1 nm/pulse), PLD is an attractive technique for compound thin film deposition. This technique offers the possibility of depositing thin films on room-temperature or low-temperature substrates, due to the high energy of the species forming the laser plasma plume expanding from the target to the substrate. This book reviews research on the depositon of c-BN films by using PLD, ion-assisted PLD and other laser-assisted procedures.

Published
2011

25. Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses

Author

D'ANNA, Emilia, LUCHES, Armando, MARTINO, Maurizio, M. Brunel, E. Majkova, S. Luby, R. Senderak, M. Jergel, F. Hamelmann, U. Kleineberg, U. Heinzmann, D'Anna, Emilia, Luches, Armando, Martino, Maurizio, M., Brunel, E., Majkova, S., Luby, R., Senderak, M., Jergel, F., Hamelmann, U., Kleineberg, and U., Heinzmann

Abstract

UHV e-beam evaporated W1-xSix/Si multilayers (MLs) with four different compositions (x = 0, 0.33, 0.5 and 0.66) were XeCl laser irradiated at different fluences F less than or equal to 0.6 J cm(-2) with number of pulses N less than or equal to 100, The samples were analyzed by soft X-ray reflectivity, X-ray diffraction and resistometry measurements. It was shown, that the hardness of the samples against laser irradiation increases with increasing x up to x = 0.5, then goes down again. This behavior is explained by the interplay of the suppression of the interdiffusion at the interfaces of MLs with increasing content of Si in W and the gradual decrease of the refractory nature of W when it is diluted by Si.

Published
1996
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26. Deposition of C-N films by reactive laser ablation

Author

D'ANNA, Emilia, LUCHES, Armando, PERRONE, Alessio, S. Acquaviva, R. Alexandrescu, I. N. Mihailescu, J. Zemek, G. Majni, D'Anna, Emilia, Luches, Armando, Perrone, Alessio, S., Acquaviva, R., Alexandrescu, I. N., Mihailescu, J., Zemek, and G., Majni

Published
1996

35. Surface Nitridation of Titanium by Excimer Laser Pulses

Author

D'ANNA, Emilia, LUCHES, Armando, MARTINO, Maurizio, G. Leggieri, P. Mengucci, I. N. Mihailescu, D'Anna, E, Leggieri, Gilberto, Luches, A, Martino, M, Mengucci, P, Mihailescu, I. N., D'Anna, Emilia, G., Leggieri, Luches, Armando, Martino, Maurizio, P., Mengucci, and I. N., Mihailescu

Published
1992

42. Pulsed laser deposition of thin refractory metal nitride films

Author

Fernandez, Manuel, primary, Bereznai, M., additional, Caricato, A. P., additional, D'Anna, Emilia, additional, Juhasz, A., additional, Leggieri, Gilberto, additional, Luches, Armando, additional, Majni, Guiseppe, additional, Martino, Maurizio, additional, Mengucci, Paolo, additional, Nagy, P. M., additional, Nanai, Laszlo, additional, and Toth, Zsolt, additional

Published
2003
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