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In this work, we have integrated bismuth zinc niobium oxide (BZN), a high-k dielectric material, in metal-insulator-semiconductor (MIS) and field-plated metal-semiconductor (FP-MS) Schottky barrier diodes on $\beta$-$Ga_2O_3$. This increases the breakdown voltage ($V_{BR}$) from 300 V to 600 V by redistributing the electric fields, leveraging the high permittivity of BZN (k ~210). Enhancement in Schottky barrier height, by approximately 0.14 eV for MIS and 0.28 eV for FP-MS devices, also contributes to the improved $V_{BR}$. BZN inclusion has minimal impact on specific on-resistance ($R_{on,sp}$). Additionally, the devices display excellent current-voltage characteristics with ideality factors close to unity and an on/off current ratio greater than 1010. This work presents the most significant $V_{BR}$ enhancement reported-to-date for MIS devices on $\beta$-$Ga_2O_3$ without compromising turn-on voltage and $R_{on,sp}$. A comparison of FP-MS and MIS devices shows that FP-MS outperforms MIS in terms of lower $R_{on,sp}$, higher Schottky barrier height, and improved VBR.

We report a monolithic bidirectional dual-gate metal-oxide-semiconductor field effect transistor (MOSFET) fabricated on epitaxially grown beta-Ga2O3, demonstrating efficient two-way conduction and blocking. It features two independently controlled gates and operates in four distinct modes, offering flexibility in managing current and voltage in the first and third quadrants. This versatility makes it ideal for various power conversion system applications. The device operates at a low negative threshold voltage (~-2.4 V for both gates) with a zero turn-on drain voltage and an on-resistance of approximately 500 ohm-mm. It exhibits a high on/off current ratio of 1e7 in all three conducting modes. In the blocking mode, the device breakdown was measured to be more than +-350 V with a current compliance of 0.5 mA/mm. The estimated breakdown field and power figure of merit for the device are 0.35 MV/cm and 1.6 MW/cm2 respectively.

Two dimensional semiconductors have attracted considerable attention owing to their exceptional electronic and optical characteristics. However, their practical application has been hindered by the limited light absorption resulting from their atomically thin thickness and low quantum yield. A highly effective approach to manipulate optical properties and address these limitations is integrating subwavelength plasmonic nanostructures with these monolayers. In this study, we employed electron beam lithography and electroplating technique to fabricate a gold nanodisc (AuND) array capable of enhancing the photoluminescence (PL) of monolayer MoS$_2$ giantly. Monolayer MoS$_2$ placed on the top of the AuND array yields up to 150-fold PL enhancement compared to that on a gold film. We explain our experimental findings based on electromagnetic simulations.

Strain can efficiently modulate the bandgap and carrier mobilities in two-dimensional (2D) materials. Conventional mechanical strain-application methodologies that rely on flexible, patterned or nano-indented substrates are severely limited by low thermal tolerance, lack of tunability and/or poor scalability. Here, we leverage the converse piezoelectric effect to electrically generate and control strain transfer from a piezoelectric thin film to electro-mechanically coupled ultra-thin 2D MoS$_2$. Electrical bias polarity change across the piezoelectric film tunes the nature of strain transferred to MoS$_2$ from compressive $\sim$0.23% to tensile $\sim$0.14% as verified through peak shifts in Raman and photoluminescence spectroscopies and substantiated by density functional theory calculations. The device architecture, built on a silicon substrate, uniquely integrates an MoS$_2$ field-effect transistor on top of a metal-piezoelectric-metal stack enabling strain modulation of transistor drain current 130$\times$, on/off current ratio 150$\times$, and mobility 1.19$\times$ with high precision, reversibility and resolution. Large, tunable tensile (1056) and compressive (-1498) strain gauge factors, easy electrical strain modulation, high thermal tolerance and substrate compatibility make this technique promising for integration with silicon-based CMOS and micro-electro-mechanical systems., Comment: Manuscript and Supplementary Information

Accurate, timely and selective detection of moving obstacles is crucial for reliable collision avoidance in autonomous robots. The area- and energy-inefficiency of CMOS-based spiking neurons for obstacle detection can be addressed through the reconfigurable, tunable and low-power operation capabilities of emerging two-dimensional (2D) materials-based devices. We present an ultra-low power spiking neuron built using an electrostatically tuned dual-gate transistor with an ultra-thin and generic 2D material channel. The 2D subthreshold transistor (2D-ST) is carefully designed to operate under low-current subthreshold regime. Carrier transport has been modelled via over-the-barrier thermionic and Fowler-Nordheim contact barrier tunnelling currents over a wide range of gate and drain biases. Simulation of a neuron circuit designed using the 2D-ST with 45 nm CMOS technology components shows high energy efficiency of ~3.5 pJ/spike and biomimetic class-I as well as oscillatory spiking. It also demonstrates complex neuronal behaviors such as spike-frequency adaptation and post-inhibitory rebound that are crucial for dynamic visual systems. Lobula giant movement detector (LGMD) is a collision-detecting biological neuron found in locusts. Our neuron circuit can generate LGMD-like spiking behavior and detect obstacles at an energy cost of <100 pJ. Further, it can be reconfigured to distinguish between looming and receding objects with high selectivity., Comment: Main text along with supporting information. 4 figures

Atomic layer deposition (ALD), a layer-by-layer controlled method to synthesize ultrathin materials, provides various merits over other techniques such as precise thickness control, large area scalability and excellent conformality. Here we demonstrate the possibility of using ALD growth on top of suspended 2D materials to fabricate nanomechanical resonators. We fabricate ALD nanomechanical resonators consisting of a graphene/MoS$_2$ heterostructure. Using AFM indentation and optothermal drive, we measure their mechanical properties including Young's modulus, resonance frequency and quality factor, showing similar values as their exfoliated and chemical vapor deposited counterparts. We also demonstrate the fabrication of nanomechanical resonators by exfoliating an ALD grown NbS$_2$ layer. This study exemplifies the potential of ALD techniques to produce high-quality suspended nanomechanical membranes, providing a promising route towards high-volume fabrication of future multilayer nanodevices and nanoelectromechanical systems., Comment: 8 pages, 6 figures

Layered two-dimensional van der Waals (vdW) semiconductors and their heterostructures have been shown to exhibit positive photoconductance (PPC) in many studies. A few recent reports have demonstrated negative photoconductance (NPC) as well that can enable broadband photodetection besides multi-level optoelectronic logic and memory. Controllable and reversible switching between PPC and NPC is a key requirement for these applications. This report demonstrates visible-to-near infrared wavelength-driven NPC and PPC, along with reversible switching between the two, in an air stable, high mobility, broadband black phosphorus (BP) field effect transistor (FET) covered with a few layer MoS$_2$ flake. The crossover switching wavelength can be tuned by varying the MoS$_2$ bandgap through its flake thickness and the NPC and PPC photoresponsivities can be modulated using electrostatic gating as well as laser power. Recombination-driven NPC and PPC allows for reversible switching at reasonable time scales of a few seconds. Further, gate voltage-dependent negative persistent photoconductance enables synaptic behavior that is well-suited for optosynaptic applications., Comment: Main Manuscript and Supporting Information

We demonstrate an Nb$_{2}$O$_{5}$/$\beta$-Ga$_{2}$O$_{3}$ metal-insulator-semiconductor (MIS) hetero-junction diode with Nb$_{2}$O$_{5}$ as the high-k dielectric insulator for more efficient electric field management resulting in enhanced breakdown characteristics compared to a $\beta$-Ga$_{2}$O$_{3}$ Schottky barrier diode. The Nb$_{2}$O$_{5}$ dielectric films were grown using atomic layer deposition and exhibited a high dielectric constant of 50. The high dielectric constant resulted in a 5$\times$ lower electric field at the metal/dielectric interface in the MIS diode compared to the metal/$\beta$-Ga$_{2}$O$_{3}$ interface in the Schottky barrier diode. With good electron conduction in forward bias enabled by the negative conduction band offset of Nb$_{2}$O$_{5}$ w.r.t $\beta$-Ga$_{2}$O$_{3}$, the MIS design led to a 3$\times$ improvement in the reverse blocking voltage with a slight trade-off in the specific on-resistance. Overall, a 3.3$\times$ increase in the power figure of merit was observed (3.25 MW/cm$^2$ for the Schottky diode and 10.8 MW/cm$^2$ for the MIS diode). A detailed analysis of the energy band line-up, and the forward and reverse current transport mechanisms are also presented using analytical modeling and 2-D TCAD simulations., Comment: The following article has been submitted to 'Journal of Applied Physics' and the link will be updated if it gets published

The application of ultrathin two-dimensional (2D) perovskites in near-infrared and visible-range optoelectronics has been limited owing to their inherent wide bandgaps, large excitonic binding energies and low optical absorption at higher wavelengths. Here, we show that by tailoring interfacial band alignments via conjugation with low-dimensional materials like monolayer transition metal dichalcogenides (TMD), the functionalities of 2D perovskites can be extended to diverse, visible-range photophysical applications. Based on the choice of individual constituents in the 2D perovskite/TMD heterostructures, our first principles calculations demonstrate widely tunable type-II band gaps, carrier effective masses and band offsets to enable an effective separation of photogenerated excitons for enhanced photodetection and photovoltaic applications. In addition, we show the possibilities of achieving a type-I band alignment for recombination based light emitters as well as a type-III configuration for tunnelling devices. Further, we evaluate the effect of strain on the electronic properties of the heterostructures to show a significant strain tolerance, making them prospective candidates in flexible photosensors., Comment: 38 pages, main manuscript and supporting information

Electronic transmission in monolayer ReS$_{2}$ and ReS$_{2}$ based van der Waals (vdW) heterointerfaces are studied here. Since ReS$_{2}$/WSe$_{2}$ and ReS$_{2}$/MoSe$_{2}$ type-II vdW heterostructures are suitable for near infrared (NIR)/short-wave infrared (SWIR) photodetection, the role of interlayer coupling at the heterointerfaces is examined in this work. Besides, a detailed theoretical study is presented employing density functional theory (DFT) and nonequilibrium Green's function (NEGF) combination to analyse the transmission spectra of the two-port devices with ReS$_{2}$/WSe$_{2}$ and ReS$_{2}$/MoSe$_{2}$ channels and compare the near-equilibrium conductance values.Single layer distorted1T ReS$_{2}$ exhibits formation of parallel chains of 'Re' - 'Re' bonds, leading to in-plane anisotropy. Owing to this structural anisotropy, the charge carrier transport is very much orientation dependent in ReS$_{2}$. Therefore, this work is further extended to investigate the role of clusterized 'Re' atoms in electronic transmission., Comment: 18 pages // 10 figures (main manuscript) + 3 figures (supporting information)

Gas sensors built using two-dimensional (2D) MoS2 have conventionally relied on a change in field-effect-transistor (FET) channel resistance or a change in Schottky contact/pn homojunction barrier. This report demonstrates, for the first time, an NO2 gas sensor that leverages a gate tunable type II WSe2 (p)/MoS2 (n) heterojunction to realize a 4x enhancement in sensitivity, 8x lower limit of detection and improved dynamic response when compared to an MoS2 FET sensor on the same flake. Comprehensive sensing measurements over a range of analyte concentrations, gate biases and MoS2 flake thicknesses indicate a novel two-fold electrical response to NO2 exposure underlying the enhanced sensitivity of the heterojunction- (i) a series resistance change that leads to an exponential change in thermionic current at high bias, and, (ii) a carrier concentration change that leads to a linear change in interlayer recombination current near zero bias. The heterojunction diode also exhibits fast and tunable recovery under negative gate biasing. All-electrical (gate controlled) sensing and recovery operation at room temperature makes this a simple, low-overhead sensor. The ability to sense tri-nitro toluene (TNT) molecules down to a concentration of 80PPB highlights its potential as a comprehensive chemical sensing platform., Comment: Manuscript 22 pages, 7 figures: SI 12 pages, 11 figures

Clockwise to anti-clockwise hysteresis crossover in current-voltage transfer characteristics of field effect transistors (FETs) with graphene and MoS$_2$ channels holds significant promise for non-volatile memory applications. However such crossovers have been shown to manifest only at high temperature. In this work, for the first time, we demonstrate room temperature hysteresis crossover in few-layer MoS$_2$ FETs by using a gate-drain underlap design to induce a differential response from traps at the MoS$_2$-HfO$_2$ channel-gate dielectric interface to applied gate bias. The appearance of interface trap-driven anti-clockwise hysteresis at high gate voltages in underlap FETs can be unambiguously attributed to the presence of an underlap since transistors with and without the underlap region were fabricated on the same MoS$_2$ channel flake. The underlap design also enables room temperature tuning of the anti-clockwise hysteresis window (by 140$\times$) as well as the crossover gate voltage (by 2.6$\times$) with applied drain bias and underlap length. Comprehensive measurements of the transfer curves in ambient and vacuum conditions at varying sweep rates and temperatures (RT, 45 $^\circ$C and 65 $^\circ$C) help segregate the quantitative contributions of adsorbates, interface traps, and bulk HfO$_2$ traps to the clockwise and anti-clockwise hysteresis., Comment: Manuscript- 19 pages and supporting information- 3 pages 5 figures

$\beta$-Ga$_{2}$O$_{3}$ based enhancement mode transistor designs are critical for the realization of low loss, high efficiency next generation power devices with rudimentary driving circuits. A novel approach towards attaining a high positive flat band voltage (V$_{fb}$) of 10.6 V in $\beta$-Ga$_{2}$O$_{3}$ metal-oxide-semiconductor capacitors (MOSCAPs), with the ability to fine tune it between 3.5 V to 10.6 V, using a polycrystalline AlN charge trap layer has been demonstrated. This can enable enhancement mode operation over a wide doping range. Excellent V$_{fb}$ retention of ${\sim}$97% for 10$^{4}$ s at 55 $^{\circ}$C was exhibited by the gate stacks after charge trapping, hence reducing the requirement of frequent charge injection cycles. In addition, low gate leakage current density (J$_{g}$) for high negative gate voltages (V$_{g}$${\sim}$-60 V) indicates the potential of this gate stack to enable superior breakdown characteristics in enhancement mode transistors., Comment: Single file (Manuscript and Supplementary material combined) of 19 pages. Total 5 and 4 figures in manuscript and supplementary material, respectively

We introduce a deep-recessed gate architecture in $\beta$-Ga$_2$O$_3$ delta-doped field effect transistors for improvement in DC-RF dispersion and breakdown properties. The device design incorporates an unintentionally doped $\beta$-Ga$_2$O$_3$ layer as the passivation dielectric. To fabricate the device, the deep-recess geometry was developed using BCl$_3$ plasma based etching at ~5 W RIE to ensure minimal plasma damage. Etch damage incurred with plasma etching was mitigated by annealing in vacuum at temperatures above 600 $\deg$C. A gate-connected field-plate edge termination was implemented for efficient field management. Negligible surface dispersion with lower knee-walkout at high V$_\mathrm{DS}$, and better breakdown characteristics compared to their unpassivated counterparts were achieved. A three terminal off-state breakdown voltage of 315 V, corresponding to an average breakdown field of 2.3 MV/cm was measured. The device breakdown was limited by the field-plate/passivation edge and presents scope for further improvement. This demonstration of epitaxially passivated field effect transistors is a significant step for $\beta$-Ga$_2$O$_3$ technology since the structure simultaneously provides control of surface-related dispersion and excellent field management.

PN heterojunctions comprising layered van der Waals (vdW) semiconductors have been used to demonstrate current rectifiers, photodetectors, and photovoltaic devices. However, a direct or near-direct bandgap at the heterointerface that can significantly enhance optical generation, for high light absorbing few/multi-layer vdW materials, has not yet been shown. In this work, for the first time, few-layer group-6 transition metal dichalcogenide (TMD) $WSe_2$ is shown to form a sizeable (0.7 eV) near-direct bandgap with type-II band alignment at its interface with the group-7 TMD $ReS_2$ through density functional theory calculations. Further, the type-II alignment and photogeneration across the interlayer bandgap have been experimentally confirmed through micro-photoluminescence and IR photodetection measurements, respectively. High optical absorption in few-layer flakes, large conduction and valence band offsets for efficient electron-hole separation and stacking of light facing, direct bandgap $ReS_2$ on top of gate tunable $WSe_2$ are shown to result in excellent and tunable photodetection as well as photovoltaic performance through flake thickness dependent optoelectronic measurements. Few-layer flakes demonstrate ultrafast response time (5 $\mu$s) at high responsivity (3 A/W) and large photocurrent generation and responsivity enhancement at the heterostructure overlap region (10-100X) for 532 nm laser illumination. Large open-circuit voltage of 0.64 V and short-circuit current of 2.6 $\mu$A enables high output electrical power. Finally, long term air-stability and a facile single contact metal fabrication process makes the multi-functional few-layer $WSe_2$/$ReS_2$ heterostructure diode technologically promising for next-generation optoelectronic applications., Comment: Manuscript- 27 pages, 8 figures. Supporting Information- 17 pages, 17 figures

Vertical stacks of two-dimensional (2D) materials, separated by the van der Waals gap and held together by the van der Waals forces, are immensely promising for a plethora of nanotechnological applications. Charge control in these stacks may be modeled using either a simple electrostatics approach or a detailed atomistic one. In this paper, we compare these approaches for a gated 2D transition metal dichalcogenide bilayer and show that recently reported electrostatics-based models of this system give large errors in band energy compared to atomistic (Density Functional Theory) simulations. These errors are due to the tails of the ionic potentials that reduce the electrical-equivalent van der Waals gap between the 2D layers, and can be corrected by using the reduced gap in the electrostatic model. For a physical van der Waals gap (defined as the chalcogen to chalcogen distance) of 3 $\mathrm{\AA}$ in a 2D bilayer, the electrical-equivalent gap is less than 1 $\mathrm{\AA}$. For the example of band-to-band tunneling based ultra low-power transistors, this is seen to lead to errors of several hundred millivolts and more in the threshold voltage estimated from electrostatics.

Modulation-doped heterostructures are a key enabler for realizing high mobility and better scaling properties for high performance transistors. We report the realization of modulation-doped two-dimensional electron gas (2DEG) at beta(Al0.2Ga0.8)2O3/ Ga2O3 heterojunction using silicon delta doping. The formation of a 2DEG was confirmed using capacitance voltage measurements. A modulation-doped 2DEG channel was used to realize a modulation-doped field-effect transistor. The demonstration of modulation doping in the beta-(Al0.2Ga0.8)2O3/ Ga2O3 material system could enable heterojunction devices for high performance electronics.

FinFET technology is prone to suffer from Line Edge Roughness (LER) based VT variation with scaling. To address this, we proposed an Epitaxially Defined (ED) FinFET (EDFinFET) as an alternate to FinFET architecture for 10 nm node and beyond. We showed by statistical simulations that EDFinFET reduces LER based VT variability by 90% and overall variability by 59%. However, EDFinFET consists of wider fins as the fin widths are not constrained by electrostatics and variability (cf. FinFETs have fin width ~ LG/3 where LG is gate-length). This indicates that EDFinFET based circuits may be less dense. In this study we show that wide fins enable taller fin heights. The ability to engineer multiple STI levels on tall fins enables different transistor widths (i.e. various W/Ls e.g. 1-10) in a single fin. This capability ensures that even though individual EDFinFET devices have ~2x larger footprints than FinFETs, EDFinFET may produce equal or higher circuit density for basic building blocks like inverters or NAND gates for W/Ls of 2 and higher.

We present a simple and reliable method for making electrical contacts to small organic molecules with thiol endgroups. Nanometer-scale gaps between metallic electrodes have been fabricated by passing a large current through a lithographically-patterned Au-line with appropriate thickness. Under appropriate conditions, the passage of current breaks the Au-line, creating two opposite facing electrodes separated by a gap comparable to the length of small organic molecules. Current-voltage characteristics have been measured both before and after deposition of short organic molecules. The resistance of single 1,4-benzenedithiol and 1,4-bezenedimethanedithiol molecules were found to be 9M$\Omega$ and 26M$\Omega$, respectively. The experimental results indicate strong electronic copuling to the contacts and are discussed using a relatively simple model of mesoscopic transport. The use of electrodes formed on an insulating surface by lithography and electromigration provides a stable structure suitable for integrated circuit applications.