37 results on '"Liu, P.W."'
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2. La2O3 addition for improving the brazed joints of WC-Co/1Cr13
3. Investigation on evolution mechanisms of site-specific grain structures during metal additive manufacturing
4. Texture evolution of cholesteric liquid crystal driven by a thermal process
5. Review of influenza-associated pulmonary aspergillosis in ICU patients and proposal for a case definition: an expert opinion
6. Review of influenza-associated pulmonary aspergillosis in ICU patients and proposal for a case definition: an expert opinion
7. Hydrogen transport and degradation of a commercial duplex stainless steel
8. Optical studies of strained type II GaAs0.7Sb0.3/GaAs multiple quantum wells
9. A critical comparison between CPM and PERT with Monte Carlo simulation in project management and scheduling
10. Strategy of water pollution prevention in Taihu Lake and its effects analysis
11. 18.3 Superior Current Enhancement in SiGe Channel p-MOSFETs Fabricated on [110] Surface
12. Hydrogen susceptibility of an interstitial free steel
13. A new and simple experimental approach to characterizing the carrier transport and reliability of strained CMOS devices in the quasi-ballistic regime.
14. More strain and less stress- the guideline for developing high-end strained CMOS technologies with acceptable reliability.
15. Technology Roadmaps on the Ballistic Transport in Straln Engineered Nanoscale CMO0S Devices.
16. Mobility and Strain Effects on <110>/(110) SiGe channel pMOSFETs for High Current Enhancement.
17. Single stress liner for both NMOS and PMOS current enhancement by a novel ultimate spacer process.
18. A distributed and interactive three-dimensional medical image system
19. Lorenz Domination And Global Tax Progressivity
20. The understanding of strain-induced device degradation in advanced MOSFETs with process-induced strain technology of 65nm node and beyond.
21. Segmented tri-gate bulk CMOS technology for device variability improvement.
22. Design of high-performance and highly reliable nMOSFETs with embedded Si:C S/D extension stressor(Si:C S/D-E).
23. A new observation of strain-induced slow traps in advanced CMOS technology with process-induced strain using random telegraph noise measurement.
24. Sub-32nm CMOS technology enhancement for low power applications.
25. Dopant and thermal interaction on SPE formed SiC for NMOS performance enhancement.
26. Improved Layout Dependence in High Performance SiGe Channel CMOSFETs.
27. Optimal PD-SOI Technology for High Performance Applications.
28. Schottky Source/Drain CMOS Device Optimization with Dopant-Segregated NiPt Silicide.
29. New observation of an abnormal leakage current in advanced CMOS devices with short channel lengths down to 50nm and beyond.
30. 65nm CMOS BULK to SOI comparison.
31. Circuit Performance Optimization in Advanced PD-SOI CMOS Development.
32. The Channel Backscattering Characteristics of Sub-100nm CMOS Devices with Different Channel/Substrate Orientations.
33. Strain Effects of Si and SiGe Channel on (100) and (110) Si Surfaces for Advanced CMOS Applications.
34. SiGe Channel CMOSFETs Fabricated on (110) Surfaces with TaC/HfO2 Gate Stacks.
35. Unique Ultra Shallow Junction Scheme with Conventional Activation Process.
36. Predicting L-band Microwave Attenuation through Forest Canopy using Directional Structuring Elements and Airborne Lidar.
37. Review of influenza-associated pulmonary aspergillosis in ICU patients and proposal for a case definition: an expert opinion
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