1. High Temperature Oxidation of ZrO2/Al2O3 Thin Films Deposited on Steel
- Author
-
Jae Chun Lee, Kim Sk, Van Trung T, and Lee Db
- Subjects
Materials science ,Diffusion ,Biomedical Engineering ,Bioengineering ,General Chemistry ,Substrate (electronics) ,engineering.material ,Condensed Matter Physics ,law.invention ,Amorphous solid ,Barrier layer ,Chemical engineering ,law ,Tool steel ,engineering ,General Materials Science ,Thin film ,Crystallization ,Monoclinic crystal system - Abstract
Thin ZrO2/Al2O3 films that consisted of alternating monoclinic ZrO2 nanolayers and amorphous Al2O3 nanolayers were deposited on a tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system, and then oxidized at 600-900 degrees C in air for up to 50 h. The ZrO2/Al2O3 films effectively suppressed the oxidation of the substrate up to 800 degrees C by acting as a barrier layer against the outward diffusion of the substrate elements and inward diffusion of oxygen. However, rapid oxidation occurred at 900 degrees C due mainly to the increased diffusion and subsequent oxidation of steel as well as the crystallization of amorphous Al2O3.
- Published
- 2013