Search

Your search keyword '"Lee, Kyeong K."' showing total 32 results
Start Over Author "Lee, Kyeong K."
32 results on '"Lee, Kyeong K."'

6. Using Neural Networks to Construct Models of the Molecular Beam Epitaxy Process

Author

Lee, Kyeong K., Brown, Terence, Dagnall, Georgianna, Bicknell-Tassius, Robert, Brown, April, and May, Gary S.

Subjects
Semiconductor chips, Semiconductor industry -- Research, Neural networks -- Research, Molecular beams -- Usage, Business, Computers, Electronics, Electronics and electrical industries
Abstract

This paper presents the systematic characterization of the molecular beam epitaxy (MBE) process to quantitatively model the effects of process conditions on film qualities. A five-layer, undoped AIGaAs and InGaAs single quantum well structure grown on a GaAs substrate is designed and fabricated. Six input factors (time and temperature for oxide removal, substrate temperatures for AIGaAs and InGaAs layer growth, beam equivalent pressure of the As source and quantum well interrupt time) are examined by means of a fractional factorial experiment. Defect density, X-ray diffraction, and photoluminescence are characterized by a static response model developed by training back-propagation neural networks. In addition, two novel approaches for characterizing reflection high-energy electron diffraction (RHEED) signals used in the real-time monitoring of MBE are developed. In the first technique, principal component analysis is used to reduce the dimensionality of the RHEED data set, and the reduced RHEED data set is used to train neural nets to model the process responses. A second technique uses neural nets to model RHEED intensity signals as time series, and matches specific RHEED patterns to ambient process conditions. In each case, the neural process models exhibit good agreement with experimental results. Index Terms--Molecular beam epitaxy (MBE), neural networks, process modeling.

Published
2000

14. Growth of ZnO Nanorod Arrays on Flexible Substrates: Effect of Precursor Solution Concentration

Author

Tong, Fei, primary, Kim, Kyusang, additional, Wang, Yaqi, additional, Thapa, Resham, additional, Sharma, Yogesh, additional, Modic, Aaron, additional, Claude Ahyi, Ayayi, additional, Issacs-Smith, Tamara, additional, Williams, John, additional, Ahn, Hosang, additional, Park, Hyejin, additional, Kim, Dong-Joo, additional, Lee, Sungkoo, additional, Lim, Eunhee, additional, Lee, Kyeong K., additional, and Park, Minseo, additional

Published
2012
Full Text
View/download PDF

32. Preparation of Indium Tin Oxide Inks for Electrically Conductive Transparent Oxide Film with Ink-Jet Printing Method.

Author

JeJeong Yu, Sungkoo Lee, Eunhee Lim, TaeHo Kim, and Lee, Kyeong K.

Subjects
INDIUM, ELECTRONIC equipment, INK-jet printing, X-ray diffraction, THIN films
Abstract

The ink-jet printing method is an important process in display industry due to the low-cost production of large-scale electronic devices. In this work, we prepared the nanoparticle indium tin oxide (ITO) solutions for ink-jet printing and characterized the electrical, structural and morphological properties of the film. The improvement of conductivity after reduction process was correlated with the sharpening of the diffraction peak as proved by X-ray diffraction measurement. The ITO inks was coated on a glass by spin-coating process and patterned by the ink-jet printing technique using a 50 μm diameter ink-jet nozzle. The sheet resistance and optical transmission of ITO thin film was ca. 50∼300Ω/sq and ca. 75∼95%, respectively. The electrical resistance of patterned ITO lines showed about 5∼30 * 103Ω. The detailed relationship between microstructure and properties are discussed. [ABSTRACT FROM AUTHOR]

Published
2010
Full Text
View/download PDF

Catalog

Books, media, physical & digital resources
See catalog results