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Your search keyword '"Lampert, M.O."' showing total 10 results
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10 results on '"Lampert, M.O."'

1. Characterisation of an n-type segmented BEGe detector

Author

Abt, I., primary, Caldwell, A., additional, Donmez, B., additional, Etrillard, C., additional, Gooch, C., additional, Hauertmann, L., additional, Lampert, M.O., additional, Liao, H., additional, Liu, X., additional, Ma, H., additional, Majorovits, B., additional, Schulz, O., additional, and Schuster, M., additional

Published
2019
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2. Germanium ``hexa'' detector: production and testing

Author

Sarajlić, M., primary, Pennicard, D., additional, Smoljanin, S., additional, Hirsemann, H., additional, Struth, B., additional, Fritzsch, T., additional, Rothermund, M., additional, Zuvic, M., additional, Lampert, M.O., additional, Askar, M., additional, and Graafsma, H., additional

Published
2017
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6. On the use of thin ion implanted Si detectors in heavy ion experiments

Author

Lavergne-Gosselin, L., Stab, L., Lampert, M.O., Gustafsson, H.-Å., Jakobsson, B., Kristiansson, A., Oskarsson, A., Westenius, M., Kordyasz, A.J., Aleklett, K., Westerberg, L., Rydehell, M., and Tengblad, O.

Abstract

We present test results on the use of thin ion implanted epitaxial Si detectors for registration of low- and medium-energy heavy fragments in nuclear reactions. A linear energy response for very low energy nuclei has been observed. A test of 10 μm+ 300 μmtelescopes under realistic experimental conditions for heavy ion experiments exhibits the possibilities to use these detectors for the measurements of multifragmentation products.

Published
1989
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7. Optical characteristics of thin silicon films deposited by CVD and annealed by pulsed laser

Author

Lampert, M.O., Muller, J.C., Ponpon, J.P., Siffert, P., Institut de Recherches Subatomiques (IReS), Institut National de Physique Nucléaire et de Physique des Particules du CNRS (IN2P3)-Cancéropôle du Grand Est-Université Louis Pasteur - Strasbourg I-Centre National de la Recherche Scientifique (CNRS), and Heyd, Yvette

Subjects
[PHYS.PHYS.PHYS-INS-DET] Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det], [PHYS.PHYS.PHYS-INS-DET]Physics [physics]/Physics [physics]/Instrumentation and Detectors [physics.ins-det]
Published
1982

8. Syrano: a new apparatus for an analytical follow-up of ore-dressing.

Author

Pinault J.L., Lampert M.O., Moal J.Y., Peuziat C., Prevosteau J.M., Szczyhel M., Pinault J.L., Lampert M.O., Moal J.Y., Peuziat C., Prevosteau J.M., and Szczyhel M.

Abstract

Syrano is an x-ray fluorescence machine developed for the mining industry. It is designed for the examination of cuttings from test boreholes or of cores. An account of its performance for complex sulphide ores and tin ores is then given., Syrano is an x-ray fluorescence machine developed for the mining industry. It is designed for the examination of cuttings from test boreholes or of cores. An account of its performance for complex sulphide ores and tin ores is then given.

10. Removal and deposition efficiencies of the long-lived 222Rn daughters during etching of germanium surfaces

Author

Zuzel, G., Wójcik, M., Majorovits, B., Lampert, M.O., and Wendling, P.

Subjects
*RADON isotopes, *PLASMA etching, *METALLIC surfaces, *GERMANIUM diodes, *SOLUTION (Chemistry), *POLONIUM isotopes
Abstract

Abstract: Removal and deposition efficiencies of the long-lived 222Rn daughters during etching from and onto surfaces of standard and high purity germanium were investigated. The standard etching procedure of Canberra–France used during production of high purity n-type germanium diodes was applied to germanium discs, which have been exposed earlier to a strong radon source for deposition of its progenies. An uncontaminated sample was etched in a solution containing 210Pb, 210Bi and 210Po. All isotopes were measured before and after etching with appropriate detectors. In contrast to copper and stainless steel, they were removed from germanium very efficiently. However, the reverse process was also observed. Considerable amounts of radioactive lead, bismuth and polonium isotopes present initially in the artificially polluted etchant were transferred to the clean high purity surface during processing of the sample. [Copyright &y& Elsevier]

Published
2012
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