1. Differential deposition applied to x-ray mirror substrate
- Author
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Bras, Patrice, Labouré, Sylvain, Vivo, Amparo, Perrin, François, and Morawe, Christian
- Subjects
Physics - Applied Physics - Abstract
The process of differential deposition is currently applied at the ESRF in order to correct figure errors of x-ray optics substrates, prior to multilayer deposition. The substrate is moved at a controlled speed in front of a sputtering source to precisely control the deposition profile. This work will describe the concept of differential deposition at the ESRF as well as recent results of its implementation to correct a real mirror substrate surface. Finally, initial studies using a synchrotron beamline characterization technique based on x-ray total reflection are presented., Comment: 6 pages, 7 figures, SPIE Optics + Optoelectronics 2023, Prague
- Published
- 2023
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