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2. Silicide formation by high-temperature reaction of Rh with model SiO[sub 2] films.

Author

Labich, S. and Kohl, A.

Subjects
*RHODIUM, *SILICA, *CHEMICAL vapor deposition, *REACTIVITY (Chemistry)
Abstract

Investigates the metal-support interaction between rhodium and silica for a rhodium/silicon dioxide/molybdenum model system. Use of chemical vapor deposition in preparing thin silicon oxide layers; Effect of heating in ultrahigh vacuum on the cluster size and binding energies of surface species.

Published
1998
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4. A round robin experiment of elemental sensitivity factors in low-energy ion scattering

Author

UCL, Brongersma, HH, Carrere-Fontaine, H, Cortenraad, R, van der Gon, AWD, Scanlon, PJ, Spolveri, I, Cortigiani, B, Bardi, U, Taglauer, E, Reiter, S, Labich, S, Bertrand, Patrick, Houssiau, L., Speller, S, Parascandola, S, Unlu-Lachnitt, H, Heiland, W, UCL, Brongersma, HH, Carrere-Fontaine, H, Cortenraad, R, van der Gon, AWD, Scanlon, PJ, Spolveri, I, Cortigiani, B, Bardi, U, Taglauer, E, Reiter, S, Labich, S, Bertrand, Patrick, Houssiau, L., Speller, S, Parascandola, S, Unlu-Lachnitt, H, and Heiland, W

Abstract

In a round robin experiment a set of five polycrystalline, metallic samples is studied by low-energy ion scattering (LEIS) in five different laboratories, The energy range is 0.6-3.5 keV and He and Ne ions are used. Even though different experimental setups are used the evaluated elemental sensitivity factors agree within +/-20%. Reproducibility within single laboratories is better than 10%. In an additional study carried out in three laboratories the surface composition of an alloy, Cu55Pd45, was determined, using in situ calibration standards, These surface composition measurements agreed within +/-3 at% demonstrating that quantitative composition determination is possible using this procedure. (C) 1998 Elsevier Science B.V. All rights reserved.

Published
1998

6. A round robin experiment of elemental sensitivity factors in low-energy ion scattering

Author

Brongersma, H.H., primary, Carrere-Fontaine, M., additional, Cortenraad, R., additional, Denier van der Gon, A.W., additional, Scanlon, P.J., additional, Spolveri, I., additional, Cortigiani, B., additional, Bardi, U., additional, Taglauer, E., additional, Reiter, S., additional, Labich, S., additional, Bertrand, P., additional, Houssiau, L., additional, Speller, S., additional, Parascandola, S., additional, Ünlü-Lachnitt, H., additional, and Heiland, W., additional

Published
1998
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